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Position detection apparatus, imprint apparatus, and method for manufacturing device

A detection device and detection method technology, applied in the direction of measuring devices, nanotechnology for information processing, optical devices, etc., can solve the problems of measurement accuracy degradation and achieve the effect of improving detection accuracy

Active Publication Date: 2013-06-26
CANON KK
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

When the intensity of alignment detection light decreases, the influence of detector electrical noise etc. degrades the measurement accuracy of alignment

Method used

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  • Position detection apparatus, imprint apparatus, and method for manufacturing device
  • Position detection apparatus, imprint apparatus, and method for manufacturing device
  • Position detection apparatus, imprint apparatus, and method for manufacturing device

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Embodiment Construction

[0021] Various exemplary embodiments, features, and aspects of the invention will be described in detail below with reference to the accompanying drawings.

[0022] First, refer to Figure 1A , Figure 1B and Figure 1C as well as Figure 2A , Figure 2B , Figure 2C and Figure 2D A first exemplary embodiment of the present invention will be described. Figure 1A , Figure 1B and Figure 1C is a diagram showing the configuration of the position detection device 100 according to the first exemplary embodiment, and shows an example in which the present invention is applied to an alignment detection device of an imprint device. In the present exemplary embodiment described below, a position detection device and a position detection method for acquiring relative positions by using a mold and a wafer as two different objects will be described.

[0023] will refer to Figure 1A The configuration of the position detection device 100 will be described. Light emitted from a li...

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PUM

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Abstract

The invention discloses a position detection apparatus, an imprint apparatus, and a method for manufacturing a device. A position detection apparatus that illuminates diffraction gratings formed on two objects with light from a light source and receives diffracted light from the diffraction gratings to acquire relative positions of the two objects includes: an optical system configured to cause plus n-th order diffracted light and minus n-th order diffracted light from each of the diffraction gratings to interfere with each other, where n is a natural number; a light receiving unit; and a processing unit, wherein the light receiving unit receives a two-beam interference light from each of the diffraction gratings, and wherein the processing unit acquires the relative positions of the two objects by using the two-beam interference light at an area where two-beam interference lights of the diffracted light from the respective diffraction gratings do not overlap each other among the two-beam interference lights of the diffracted light from each of the diffraction gratings.

Description

technical field [0001] The invention relates to a position detection device, an embossing device and a method for manufacturing a device. Background technique [0002] Imprint technology, which is a technique for transferring a fine structure on a mold to a workpiece such as a resin or a semiconductor substrate, has attracted attention in recent years. Imprint technology enables mass production of semiconductor devices at low cost without requiring large-scale equipment such as vacuum processing. [0003] In the imprint technique, a workpiece formed by applying a resin to a substrate in advance is prepared. As the resin, for example, a photocurable resin or a thermosetting resin can be used. The resin on the substrate is brought into contact with the mold having the desired uneven pattern to fill the uneven pattern with the resin. The resin is cured by UV radiation or heat while the resin and the mold are in contact with each other. Thereafter, the cured resin and the mo...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01B11/00G03F7/00
CPCG03F7/0002G03F9/7042G03F9/7049B82Y10/00B82Y40/00G01B11/14H01L21/0274
Inventor 松本隆宏
Owner CANON KK
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