Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Wood seed tannic acid treatment cream

A technology of tannic acid and chai seed, which is applied in the direction of ointment delivery, medical preparations of non-active ingredients, plant raw materials, etc., can solve the problems of inapplicability, prevent bacterial infection, facilitate elimination, stop excessive secretion and hemostatic effect

Inactive Publication Date: 2013-06-12
赵君雄
View PDF1 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, it is not suitable for the affected area with acute and large amount of exudate, not suitable for eczema, erosion, ulcer, blister and impetigo

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] Example 1: Using Carbopol as a matrix, the components were thoroughly mixed according to the following weight percentages: Chai Seed Extract 10%, Glycerin 20%, Carbopol 940 0.5%, Triethanolamine 0.5%, Sodium Benzoate 2 %, tannic acid 5%, water 62%.

Embodiment 2

[0030] Example 2: Using gelatin glycerin as a matrix, the components were thoroughly mixed according to the following weight percentages: Chai Seed Extract 10%, glycerin 30%, gelatin 2%, and water 58%.

Embodiment 3

[0031] Example 3: Using Carbopol as a matrix, the components were thoroughly mixed according to the following weight percentages: Chai Seed Extract 1%, Glycerin 30%, Carbopol 940 1%, Triethanolamine 0.3%, Sodium Benzoate 2 %, tannic acid 10%, water 55.7%.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides wood seed tannic acid treatment cream, and belongs to the technical field of medicinal appliances. The cream consists of the following components in percentage by weight: 1 to 30 percent of wood seed extract, 1 to 30 percent of glycerol, and the balance of water-soluble matrix. The wood seed tannic acid treatment cream is prepared by mixing wood seed extract which is extracted from natural product wood seeds, glycerol and water-soluble matrix in a specific proportion, has the advantages of quick drug release, no greasy feeling, no irritation and tissue exudation absorption, is easy to apply, does not contain antibiotics or hormone by directly using the wood seed extract, can be used for treating exudative ulcer, burns, eczema, infantile eczema, infant red buttock, haemorrhoids, bedsore and the like with good curative effect, and is suitable for popularization and application.

Description

technical field [0001] The invention belongs to the technical field of medical supplies, and in particular relates to a Chai Seed Tannin care ointment for treating exudative ulcers, scalds, eczema, milk moss, bedsores, baby red buttocks, hemorrhoids, bedsores and the like. Background technique [0002] There are many kinds of ointments used in clinical skin diseases, mainly antibacterial and antiviral preparations, hormone drugs, keratin exfoliants or keratinogenic agents and so on. Among them, the treatment of eczema, milk moss, and baby red buttocks basically requires the use of hormone-containing drugs, but hormone-containing drugs should not be used in large areas or for too long. , but also aggravate symptoms; long-term use of antibiotics-containing drugs will also lead to the continuous increase of drug resistance in the human body, which is not beneficial to the body. [0003] The bases used in skin ointments include oil-soluble bases, water-soluble bases, and emulsi...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): A61K36/00A61K47/32A61K47/42A61K47/38A61K47/34A61K9/06A61P17/02A61P9/14A61P17/00
Inventor 赵君雄
Owner 赵君雄
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products