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Method for improving thermochromatic characteristic of vanadium dioxide film

A vanadium dioxide and thin film technology is applied in the field of preparing vanadium dioxide sculpture thin films on a substrate by using a vacuum oblique deposition technology, which can solve the problems of low visible light transmittance, unsatisfactory thermochromic performance and the like, and achieve improved thermochromic performance. , The effect of visible light transmittance improvement

Active Publication Date: 2013-03-27
GUANGZHOU INST OF ENERGY CONVERSION - CHINESE ACAD OF SCI
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  • Description
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  • Application Information

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Problems solved by technology

[0004] In order to solve the problems of low visible light transmittance and unsatisfactory thermochromic performance in the preparation of vanadium dioxide thin films by traditional physical vapor deposition, and enrich the preparation technology of vanadium dioxide thin films, the present invention provides a simple and easy-to-implement Method for growing vanadium dioxide thin film to improve thermochromic properties of vanadium dioxide thin film

Method used

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  • Method for improving thermochromatic characteristic of vanadium dioxide film
  • Method for improving thermochromatic characteristic of vanadium dioxide film

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Embodiment 1

[0021] In the chamber of the electron beam evaporation equipment, adjust the angle between the substrate and the evaporation source to 20 degrees, use vanadium pentoxide particles as the film material, the substrate temperature is room temperature, and the oxygen partial pressure is 2*10 -3 At Pa, a vanadium dioxide film is deposited on a quartz substrate, and the deposited film is heat-treated at 600 degrees for 30 minutes in a hydrogen / argon mixed atmosphere to obtain an oblique columnar vanadium dioxide film.

Embodiment 2

[0023] In the chamber of the laser pulse deposition equipment, the angle between the substrate and the evaporation source is adjusted to 0 degrees while the substrate rotation speed is 256 revolutions per minute, vanadium tetroxide particles are used as the film material, the substrate temperature is room temperature, and the oxygen partial pressure is 2.5*10 -3 At Pa, a vanadium dioxide film is deposited on a borosilicate glass substrate, and the deposited film is heat-treated at 500 degrees for 1 hour in an argon atmosphere to obtain a helical vanadium dioxide film.

Embodiment 3

[0025] In the chamber of the electron beam evaporation equipment, the angle between the substrate and the evaporation source is adjusted to 80 degrees while the substrate rotation speed is 64 revolutions per minute. Vanadium trioxide particles are used as the film material, the substrate temperature is room temperature, and the oxygen partial pressure is 3*10 -3 At Pa, a vanadium dioxide film is deposited on the FTO conductive glass substrate, and the deposited film is heat-treated at 400 degrees for 10 hours in a mixed atmosphere of air / nitrogen to obtain a C-type vanadium dioxide film.

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Abstract

The invention relates to a method for improving the thermochromatic characteristic of a vanadium dioxide film, which is characterized by comprising the following steps of: preparing the vanadium dioxide film with a sculpture structure on a substrate by virtue of a vacuum glancing angle deposition technology; regulating and controlling the optical performance and the thermochromatic performance of the vanadium dioxide film by virtue of the porosity and the anisotropism of the sculpture structure; and then improving the crystalline characteristic of the vanadium dioxide film via later-stage heat treatment. The film prepared by the method can be widely applied to the fields of intelligent energy-saving windows, temperature-controlled switches, thermistors, optical storage, infrared protection and the like.

Description

technical field [0001] The invention belongs to the technical field of functional materials and thin films, and relates to a method for improving the thermochromic properties of a vanadium dioxide thin film, in particular to a method for preparing a vanadium dioxide sculpture thin film on a substrate by using a vacuum oblique deposition technique. technical background [0002] Vanadium dioxide is a phase change material, which contains A phase, B phase, C phase, R phase, M phase, where M phase and R phase will change from infrared transparent semiconductor state (M phase) to The infrared-opaque metallic state (R-phase) transitions, accompanied by sudden changes in optical, electrical, and magnetic properties. These changes can be widely used in intelligent energy-saving windows, temperature control switches, thermistors, optical storage, infrared protection and other fields. Therefore, the research on vanadium dioxide thin film has very important scientific value and practi...

Claims

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Application Information

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IPC IPC(8): C23C14/08C23C14/58C23C14/54
Inventor 肖秀娣徐刚孙耀明程浩亮
Owner GUANGZHOU INST OF ENERGY CONVERSION - CHINESE ACAD OF SCI
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