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Elliptic partial measurement device and measurement method based on spatial light modulator

A technology of spatial light modulator and measuring device, which is applied in the direction of measuring devices, optical devices, instruments, etc., can solve problems such as azimuth deviation, lower measurement accuracy, and system instability, and achieve fast modulation speed, improved accuracy, and modulation high precision effect

Inactive Publication Date: 2013-03-20
TSINGHUA UNIV
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  • Summary
  • Abstract
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  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Polarizing device rotation type ellipsometers reduce their measurement accuracy due to system instability and azimuth deviation caused by rotating parts; the disadvantage of photoelastic modulation type is that the modulator is susceptible to temperature

Method used

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  • Elliptic partial measurement device and measurement method based on spatial light modulator
  • Elliptic partial measurement device and measurement method based on spatial light modulator
  • Elliptic partial measurement device and measurement method based on spatial light modulator

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Embodiment Construction

[0039] The present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments.

[0040] Such as figure 1 and Figure 5 As shown, an ellipsometry device based on a spatial light modulator of the present invention includes an incident arm 1 with a polarization state and a spot size control component, a receiving arm 2 with a polarization state and a spot size control component, and a receiving arm 2 with a A control system 3 in which the incident arm 1 of the polarization state and spot size control component is connected to the receiving arm 2 with the polarization state and spot size control component;

[0041] The incident arm 1 with polarization state and spot size control components includes sequentially arranged along the incident light path:

[0042] Laser 4, used to emit single-frequency light that irradiates the object to be measured;

[0043] A collimating beam expanding device 5, configured to collimat...

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Abstract

The invention relates to an elliptic partial measurement device and a measurement method based on a spatial light modulator, which are applied to observation measurement on the thickness of a sample surface nano-scale thin film. The elliptic partial measurement device has the characteristics that the phase delay of polarization in the two vertical directions of a light beam is changed by adopting the spatial light modulator, an elliptic partial image of the sample surface thin film is recorded by adopting an area array detector, data is processed by adopting a fitting algorithm and an iterative algorithm, and the shape parameter of the sample surface thin film is accurately measured. The elliptic partial measurement device has the beneficial effects that no rotating part exists, the system instability and the azimuth angle deviation are eliminated, the elliptic partial measurement device is not sensitive to temperature, and the defects of a polarizer rotating type and photo-elastic modulation type ellipsometer are effectively overcome.

Description

technical field [0001] The invention relates to a measuring device and a measuring method for film thickness, in particular to an ellipsometric measuring device and a measuring method based on a spatial light modulator. Background technique [0002] Ellipsometry is a measurement technique that uses polarized light to measure film or interface parameters, and obtains parameters such as thickness and refractive index of the sample by measuring the polarization state change of the light reflected (or transmitted) by the sample. Ellipsometer is widely used in the determination of film thickness and optical constants. It can measure multi-layer films at the same time. The film thickness measurement range is large, from several nanometers to 1 micron. Ellipsometer is a fast, high-precision, non-contact optical measuring instrument, which can be applied in various complex environments, and can measure the refraction of various semiconductors and their oxide components, gradient fil...

Claims

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Application Information

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IPC IPC(8): G01B11/24G01B11/06
Inventor 孟方方张继涛吴学健李岩
Owner TSINGHUA UNIV
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