Atomic beam filling processing device

Abstract

The invention discloses an atomic beam filling processing device, and relates to a workpiece surface processing method. The device comprises a base, a linear motor, an X-axis bearing plate, a Y-axis bearing plate, supports, a beam, a Z-axis bearing plate, a rotating disk, a fixing seat, a servomotor, an atomic beam generator, an atomic beam energy control device and a collimating device, wherein the linear motor is fixed on the base and is fixedly connected with the X-axis bearing plate which is connected with the base; the Y-axis bearing plate is connected with the X-axis bearing plate, and the Z-axis bearing plate is connected with the beam; the supports are fixed at two ends of the base; the beam is connected with the supports; the rotating disk is fixed on the Z-axis bearing plate; the servomotor is fixed on the Z-axis bearing plate; the tail of a rotating shaft of the servomotor is provided with a gear; the atomic beam generator is arranged on the upper part of the atomic beam energy control device; the collimating device is arranged at the bottom of the atomic beam energy control device and is aligned with a workpiece surface defect; the atomic beam energy control device is fixed on the rotating disk through the fixing seat; and an atomic beam filling device is arranged on the Z-axis bearing plate.

Description

technical field [0001] The invention relates to a workpiece surface processing method, in particular to an atomic beam filling processing device. Background technique [0002] Ion beam processing is a typical microfabrication process and ultra-precision processing method for the surface of the sample in units of atoms and molecules. It has broad application prospects in the microelectronics industry and has become an indispensable process in the manufacture of micromachines. (Zhang Dongyan, Chen Techao. Development of a new type of ion beam etching device [J]. Special Equipment for Electronic Industry, 2010, (01): 34-36.), this is a project involving microelectronics, optoelectronics, precision machinery , computer, micro-analysis and other comprehensive fields of high-tech. This technology is mainly used in the field of microfabrication such as etching, implantation, exposure, deposition, mask correction, and integrated circuit repair; the field of high spatial resolution ...

AI Technical Summary

Problems solved by technology

However, the ion beam generating device is usually relatively complex and bulky, which causes great inconvenience during processing, and the method of removal is used for processing, and the workpiece often only has a small local defect, which requires large-scale removal processing.

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