Structures And Methods Of Fabricating Dual Gate Devices
A double gate and gate trench technology, applied in semiconductor/solid-state device manufacturing, semiconductor devices, electrical components, etc., can solve problems such as low on-resistance and difficult manufacturing
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[0017] In the following detailed description of the invention, numerous specific details are set forth in order to provide a thorough understanding of the invention. It will be appreciated, however, by one skilled in the art that the invention may be practiced without these specific details or with their equivalents. In other instances, well-known methods, procedures, components, and circuits have not been described in detail so as not to unnecessarily obscure aspects of the present invention.
[0018] Some portions of the detailed description below will be expressed in terms of procedures, logical blocks, processes, and other symbolic representations of operations for fabricating a semiconductor device. These descriptions and representations are the means used by those skilled in the art of semiconductor device fabrication to most effectively convey the substance of their work to others skilled in the art. In this application, a procedure, box, process, or the like, is consi...
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