Method for measuring carrier concentration in semiconductor quantum well
A technology of carrier concentration and measurement method, which is applied in the field of detection of characteristic parameters of semiconductor optoelectronic functional materials, can solve problems such as difficulty in feasibility and measurement accuracy, inability to resolve quantum well scale, narrow subband energy gap, etc.
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[0042] The acquisition of the carrier concentration in a group of n-type doped GaAs / AlGaAs quantum wells will be described in detail below in conjunction with the accompanying drawings to the specific implementation of the present invention, but it is by no means limiting the present invention, that is, the present invention is by no means limited to this Example.
[0043] figure 1 A group of GaAs / AlGaAs doped quantum wells grown on a GaAs(001) substrate used in the present invention, wherein the n-type doping concentration of each quantum well changes continuously within a certain range, and the width of the quantum wells is all 6nm; The sample also contains a known doping concentration of 5×10 17 cm -3 The n-type GaAs electrode layer is used for the electrical measurement calibration of the Schottky barrier height. Basic physical constants of GaAs quantum well materials: the effective mass of conduction band electrons is 0.063m 0 (m 0 is the rest mass of the electron), ...
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