Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Self-assembly preparation method of colloid microsphere single-layer film

A technology of colloidal microspheres and single-layer films, which is applied in nanostructure manufacturing, nanotechnology, nanotechnology, etc., can solve the problems of difficult to form close-packed structures, low film-forming quality, and small film-forming area. High film quality, simple and controllable operation, and shortened time

Inactive Publication Date: 2012-12-19
UNIV OF ELECTRONICS SCI & TECH OF CHINA
View PDF3 Cites 27 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] In view of the above-mentioned prior art, the purpose of the present invention is to provide a self-assembly preparation method of a colloidal microsphere monolayer film with simple required equipment, easy process control, high efficiency and high output rate, aiming to solve the existing The self-assembly method has technical problems such as low film quality, difficulty in forming a close-packed structure, difficult operation, low success rate, and small film-forming area.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Self-assembly preparation method of colloid microsphere single-layer film
  • Self-assembly preparation method of colloid microsphere single-layer film
  • Self-assembly preparation method of colloid microsphere single-layer film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0025] The present invention will be further described below in conjunction with the accompanying drawings and specific embodiments.

[0026] A self-assembly preparation method of a colloidal microsphere monolayer film. After the colloidal microsphere monolayer film with a large area and high coverage is obtained by using the spin coating method, the colloidal microsphere is extruded by the surface tension of the liquid by the vapor-liquid interface method Close-packed array of hexagons. First, draw 40 μL of the colloidal microsphere mixed solution with a quantitative dropper, drop it on the surface of the substrate, and spin-coat the colloidal microsphere mixed solution on the substrate, first at low speed and then at high speed, and the relatively tightly arranged colloidal microspheres are obtained on the substrate. Spherical monolayer film, the low speed speed is 900rpm / min, the high speed speed is 1500rpm / min, and the time is 6s and 30s respectively; secondly, the substra...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a self-assembly preparation method of a colloid microsphere single-layer film. In the self-assembly preparation method, after the colloid microsphere single-layer film with large area and high coverage rate is obtained by utilizing a spin-coating method, colloid microspheres are extruded into a compactly stacked hexagon array by adopting a liquid-vapor interface method and utilizing the surface tension of liquid. Equipment used in the self-assembly preparation method is simple and cheap and is simple to operate and controllable; and the colloid microsphere single-layer film array prepared by the method has high efficiency, high yield and good film formation quality.

Description

technical field [0001] The invention relates to the technical field of microprocessing such as nanosphere etching method and photonic crystal production, and in particular to a self-assembly preparation method of a colloidal microsphere monolayer film. Background technique [0002] There are many strange new phenomena in nanoscale structures or devices, such as quantum confinement effect, Coulomb blocking effect, quantum tunneling effect and so on. Therefore, in recent years, the integration and application technology of nanomaterials and nanodevices has become a research hotspot in scientific research structures in various countries. The U.S. government launched the National Nano Initiative (NNI) in early 2000. European countries invest billions of funds every year in the research and development of nanotechnology. my country's nanotechnology research fund projects are also growing steadily at a rate of 30% year by year. Various new nano-materials and nano-products have co...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B82B3/00B82Y40/00
Inventor 董启明郭小伟翁丹妹尧超平
Owner UNIV OF ELECTRONICS SCI & TECH OF CHINA
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com