Manufacturing method of thin film transistor and manufacturing method of array base plate
A technology for thin film transistors and a manufacturing method, which is applied to the manufacture of array substrates and the manufacture of thin film transistors, can solve problems such as low alignment accuracy, uneven capacitance, alignment shift, etc., and achieve the effect of improving product quality
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[0024] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
[0025] refer to Figure 1-Figure 6 , the manufacturing method of the thin film transistor provided by the embodiment of the present invention, comprises the following steps:
[0026] S11, such as figure 1 As shown, a gate 11 is formed on a transparent substrate 001 .
[0027] Exemplarily, a gate metal thin film may be deposited on a transparent substrate by using a magnetron sputtering device, and a patterning process may be used to form a gate. Wherein, t...
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