Preparation method of nano-manganese dioxide electrode
A nano-manganese dioxide and electrode technology, which is applied in the manufacture of hybrid/electric double layer capacitors, circuits, capacitors, etc., can solve the problems of complex powder preparation process and low specific surface area impedance
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example 1
[0028] (1) With nickel foam as the substrate, ultrasonic cleaning with acetone solution, deionized water, dilute hydrochloric acid solution (concentration 5%), and deionized water for 10 minutes before constant current pulse deposition, and then placed in a vacuum oven at 100 °C after cleaning Dry in medium.
[0029] (2) 14.7g C 4 h 6 MnO 4 .H 2 O and 5.1g NaNO 3 Prepare 200ml of manganese acetate aqueous solution containing 0.3M sodium nitrate, and add ammonia water drop by drop at room temperature to adjust the pH value to 6.5.
[0030] (3) Nickel foam is the working electrode, graphite plate is the counter electrode, the solution prepared in step (2) is the electrodeposition solution, and a two-electrode system is used for constant current pulse electrodeposition. The deposition parameters are: the anode applied current is 10mA cm -2 , corresponding to the power-on time (T on ) 20S; the cathode current is -10mA·cm -2 , corresponding to the power-on time (T off ) 5S...
example 2
[0034] (1) With nickel foam as the substrate, ultrasonic cleaning with acetone solution, deionized water, dilute hydrochloric acid solution (concentration 5%), and deionized water for 10 minutes before constant current pulse deposition, and then placed in a vacuum oven at 100 °C after cleaning Dry in medium.
[0035] (2) 9.8g C 4 h 6 MnO 4 .H 2 O and 5.1g NaNO 3 Prepare 200ml of manganese acetate aqueous solution containing 0.3M sodium nitrate, and add ammonia water drop by drop at room temperature to adjust the pH value to 6.5.
[0036] (3) Nickel foam is the working electrode, graphite plate is the counter electrode, the solution prepared in step (2) is the electrodeposition solution, and a two-electrode system is used for constant current pulse electrodeposition. The deposition parameters are: the anode applied current is 10mA cm -2 , corresponding to the power-on time (T on ) 20S; the cathode current is -10mA·cm -2 , corresponding to the power-on time (T off ) 5S,...
example 3
[0040] (1) With nickel foam as the substrate, ultrasonic cleaning with acetone solution, deionized water, dilute hydrochloric acid solution (concentration 5%), and deionized water for 10 minutes before constant current pulse deposition, and then placed in a vacuum oven at 100 °C after cleaning Dry in medium.
[0041] (2) 9.8g C 4 h 6 MnO 4 .H 2 O and 6.8g NaNO 3 Prepare 200ml of manganese acetate aqueous solution containing 0.4M sodium nitrate, and add ammonia water drop by drop at room temperature to adjust the pH value to 6.5.
[0042] (3) Nickel foam is the working electrode, graphite plate is the counter electrode, the solution prepared in step (2) is the electrodeposition solution, and a two-electrode system is used for constant current pulse electrodeposition. The deposition parameters are: the anode applied current is 10mA cm -2 , corresponding to the power-on time (T on ) 20S; the cathode current is -10mA·cm -2 , corresponding to the power-on time (T off ) 5S,...
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