Ion implantation equipment and method thereof
An ion implantation equipment and ion implantation technology, applied in the field of ion implantation equipment, can solve the problem of high overall cost of the equipment, and achieve the effects of simple design, improved photoelectric conversion efficiency, and reduced cost
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[0038] The preferred embodiments of the present invention are given below in conjunction with the accompanying drawings to describe the technical solution of the present invention in detail.
[0039] refer to figure 1 and figure 2 The ion implantation apparatus of the present invention is described, wherein figure 1 Shown is the side view of the ion implantation equipment, if the figure 1 The plane shown is defined as the X-Z plane in the three-dimensional coordinate system, then figure 2 What is shown is the projection diagram of the deflection defocus magnet, deflection magnet, deflection focus magnet and electrode system in the Y-Z plane in the ion implantation equipment.
[0040] In the ion implantation equipment, the starting point of the beam path of the ion beam is an ion source system 1, and the ion source system 1 is used to extract the ion beam required for the doping process, such as the doping process required for the solar wafer. ion beam; the end point of t...
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