Polycrystalline silicon etching solution in solar cell and polycrystalline silicon etching process
A technology of solar cells and etchant, applied in crystal growth, post-processing details, post-processing and other directions, can solve the problems of low conversion efficiency, production cannot run normally, surface is not clean, etc., to achieve conversion efficiency and quality improvement, polycrystalline The effect of improving the corrosion effect and shortening the corrosion time
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Embodiment 1
[0015] Embodiment 1: A polysilicon etching solution in a solar cell is prepared by the following method, and its component ratio is calculated in parts by weight:
[0016] Inject 26 parts of deionized water into the corrosion tank, slowly pour 6 parts of hydrofluoric acid into the corrosion tank along the corrosion tank wall, and then slowly pour 64 parts of nitric acid into the corrosion tank along the corrosion tank wall; open The cooling system of the etching tank makes the liquid in the etching tank circulate and cool down, the cycle time is 10 minutes, until the temperature of the liquid in the etching tank reaches 8°C, the etching liquid is obtained; put 200 polycrystalline silicon wafers into the etching liquid at 8°C Carry out corrosion, the corrosion time is 280s, carry out at room temperature. At this time, the surface of the polycrystalline silicon wafer is clean and has good consistency, no black lines on the surface, the suede is uniform, continuous and dense, and...
Embodiment 2
[0017] Embodiment 2: A polysilicon corrosion solution in a solar cell is prepared by the following method, and its component ratio is calculated in parts by weight:
[0018] Inject 27 parts of deionized water into the corrosion tank, slowly pour 7 parts of hydrofluoric acid into the corrosion tank along the corrosion tank wall, and then slowly pour 66 parts of nitric acid into the corrosion tank along the corrosion tank wall; open The cooling system of the etching tank makes the liquid in the etching tank circulate and cool down, the cycle time is 12 minutes, until the temperature of the liquid in the etching tank reaches 6°C, the etching liquid is obtained; put 200 polycrystalline silicon wafers into the etching liquid at 6°C Corrosion is carried out at normal temperature for 300s. At this time, the surface is clean and consistent, there is no black line on the surface, the suede is uniform, continuous and dense, and the weight of the silicon wafer is 0.42g. According to this...
Embodiment 3
[0022] Embodiment 3: A polysilicon etching solution in a solar cell is prepared by the following method, and its component ratio is calculated in parts by weight:
[0023] Inject 28 parts of deionized water into the corrosion tank, slowly pour 6.5 parts of hydrofluoric acid into the corrosion tank along the corrosion tank wall, and then slowly pour 68 parts of nitric acid into the corrosion tank along the corrosion tank wall; open The cooling system of the etching tank makes the liquid in the etching tank circulate and cool down, the cycle time is 15 minutes, until the temperature of the liquid in the etching tank reaches 4°C, the etching liquid is obtained; put 200 polycrystalline silicon wafers into the etching liquid at 4°C Corrosion is carried out, the corrosion time is 320s, and it is carried out at room temperature. At this time, the surface is clean and consistent, there is no black line on the surface, the suede is uniform, continuous and dense, and the weight of the s...
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