Method for preparing indium tin oxide (ITO) film on resin substrate by using magnetron sputtering
A magnetron sputtering, resin-based technology, used in the field of preparing low-resistivity ITO films, can solve the problems of resistivity, transmittance and chemical stability that cannot meet production requirements, and achieve good chemical stability and high transmittance. The effect of low rate and resistivity
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[0015] The preparation of ITO film on the resin substrate is performed on the online vertical, continuous operation vacuum magnetron sputtering coating equipment, which mainly includes loading chamber, heating chamber, sputtering chamber, cooling chamber, unloading chamber, mechanical pump, low temperature Pumps, molecular pumps and related auxiliary components constitute a complete vacuum system, and adopt DC power supply.
[0016] The resin substrate is used to prepare the ITO film. The resin substrate used is composed of a glass substrate and a resin layer. The thickness of the glass substrate is 0.4-1.8mm, and the thickness of the resin layer is 1-5um. The production process is as follows: resin substrate inspection→cleaning→drying→inspection→loading→sending into the loading chamber→heating→sputter coating→cooling→out of film→inspection→packaging.
[0017] Specifically, the process steps are as follows:
[0018] Perform visual inspection on the resin substrate, and put th...
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