Texturing technology for transparent conducting film as top electrode of thin film solar cell
A transparent conductive film and solar cell technology, which is applied in the field of solar energy utilization, can solve the problem that the product consistency and stability are difficult to reach the transparent conductive film of thin film solar cells, the surface roughness uniformity fluctuates greatly, and the surface texture of spray etching is not easy. Control and other issues to achieve the effect of improving reliability and stability, optimizing production tact time, reducing damage and human factors
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example 1
[0020]Example 1. Under the condition of room temperature, the industrialized automatic continuous magnetron sputtering production line is used to deposit the transparent conductive film required by thin film solar cells on ordinary glass, and the corresponding texturing is carried out. The product performance is stable and the texturing When, the proportioning weight ratio range of oxalic acid (oxalic acid) in the etching solution is 0.15wt%; the proportioning weight ratio range of hydrochloric acid is 0.3wt%; the proportioning weight ratio range of the surface active stabilizer is 0.015wt%; The rest is deionized water, and the surface active stabilizer is an alkylphenol polyoxyethylene ether series surface active stabilizer. The automatic soaking time is 35 seconds, the temperature is stable at 22°C, the automatic cleaning is 4 times, and the temperature is stable at 25°C. The drying temperature and this adjustment range are 55°C. The light transmittance of the film after te...
example 2
[0021] Example 2. Under the condition of room temperature, the industrialized automatic continuous magnetron sputtering production line is adopted to deposit the transparent conductive film required by the thin-film solar cell on the tempered glass first, and the corresponding texturing is carried out. The product performance is stable. When making texture, the proportioning weight ratio range of oxalic acid (oxalic acid) in the etching solution is 0.25wt%; the proportioning weight ratio range of hydrochloric acid is 0.35wt%; the proportioning weight ratio range of surface active stabilizer is 0.015wt% %; the rest is deionized water, and the surface active stabilizer is alkylphenol polyoxyethylene ether series surface active stabilizer. The automatic soaking time is 45 seconds, the temperature is stable at 22°C, the automatic cleaning is 4 times, and the temperature is stable at 25°C. The drying temperature and this adjustment range are 65°C. The light transmittance of the fi...
example 3
[0022] Example 3: Under the condition of room temperature, the industrialized automatic continuous magnetron sputtering production line is adopted to deposit the transparent conductive film required by the thin film solar cell on the common plexiglass, and the corresponding texturing is carried out. The performance of the product is stable and the production When velvet, the proportioning weight ratio range of oxalic acid (oxalic acid) in the etching solution is 0.15wt%; the proportioning weight ratio range of hydrochloric acid is 0.3wt%; the proportioning weight ratio range of surface active stabilizer is 0.015wt% ; The rest is deionized water, and the surface active stabilizer is an alkylphenol polyoxyethylene ether series surface active stabilizer. The automatic soaking time is 35 seconds, the temperature is stable at 22°C, and the automatic cleaning is 5 times, and the temperature is stable at 25°C. The drying temperature and this adjustment range are 50°C. The light tran...
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