Naphthalenetetracarboxylic acid diimide-naphthodithiophene copolymer, preparation method and application thereof
A technology containing naphthalene tetracarboxylic acid diimide and naphthalene tetracarboxylic acid diimide, which is applied in semiconductor/solid-state device manufacturing, electric solid-state devices, semiconductor devices, etc., can solve the problem of ineffective use of sunlight, emission Insufficient spectral matching, poor solubility of naphthalimide, etc., to achieve the effect of excellent charge transport performance, good solubility, and strong absorbance
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0037] Example 1 Poly N, N'-bis-(2-octyldecyl)-1,4,5,8-naphthalene diimide-(5-methyl-6-methoxy)naphtho[2 , 1-b: Preparation of 3,4-b']dithiophene (n=30):
[0038]
[0039] Under nitrogen protection conditions, for containing N, N'-bis-(2-octyldecyl)-2,6-dibromo-1,4,5,8-naphthalene diimide (0.5mmol) and 2 , a solution of 9-bistributyltin-(5-methyl-6-methoxy)naphtho[2,1-b:3,4-b']dithiophene (0.5mmol) in DMF (18mL) was bubbled for 0.5 h to remove residual oxygen, then add Pd 2 (dba) 3 (0.014g, 0.015mmol) and P(o-Tol) 3 (0.0083g, 0.027mmol), and bubbled for 0.5h to remove residual oxygen, and then heated to 80°C for 48h in an oxygen-free atmosphere.
[0040] Add the reaction mixture dropwise to methanol for sedimentation, and dissolve it with toluene after suction filtration, methanol washing and drying steps, add it to the aqueous solution of sodium diethyldithiocarbamate, heat to 90°C and stir for 6-16h. Pass the organic phase through column chromatography of alumina, ri...
Embodiment 2
[0041] Example 2 Poly N, N'-bis-(2-hexyloctyl)-1,4,5,8-naphthalene diimide-(5-hexyl-6-decyl)naphtho[2,1- b: Preparation of 3,4-b']dithiophene (n=22):
[0042]
[0043] Under nitrogen protection condition, to containing compound N, N'-bis-(2-hexyloctyl)-2,6-dibromo-1,4,5,8-naphthalene diimide (0.5mmol) and 2 , a solution of 9-bistributyltin-(5-hexyl-6-decyl)naphtho[2,1-b:3,4-b']dithiophene (0.5 mmol) in dioxane (15 mL) was bubbled 0.5h to remove residual oxygen, then add Pd(PPh 3 ) 2 Cl 2 (10mg), and bubbling for 0.5h to remove residual oxygen, and then heated to 85°C for 36h in an oxygen-free atmosphere.
[0044] Add the reaction mixture dropwise to methanol for sedimentation, and dissolve it with toluene after suction filtration, methanol washing and drying steps, add it to the aqueous solution of sodium diethyldithiocarbamate, heat to 90°C and stir for 6-16h. Pass the organic phase through column chromatography of alumina, rinse with chlorobenzene, remove the organic...
Embodiment 3
[0045] Example 3 Poly N, N'-bis-(2-methyltetradecyl)-1,4,5,8-naphthalene diimide-(5,6-di-eicosyl)naphtho Preparation of [2,1-b:3,4-b']dithiophene (n=16):
[0046]
[0047] Under the condition of nitrogen protection, for the compound containing N, N'-bis-(2-methyltetradecyl)-2,6-dibromo-1,4,5,8-naphthalene diimide (0.5mmol ) and 2,9-bistributyltin-(5,6-di-eicosyl)naphtho[2,1-b:3,4-b']dithiophene (0.5mmol) in toluene / THF (30mL ) solution was bubbled for 0.5h to remove residual oxygen, then added Pd(PPh 3 ) 4 (8mg), and bubbling for 0.5h to remove residual oxygen, and then heated to 80°C for 72h in an oxygen-free atmosphere.
[0048] Add the reaction mixture dropwise to methanol for sedimentation, and dissolve it with toluene after suction filtration, methanol washing and drying steps, add it to the aqueous solution of sodium diethyldithiocarbamate, heat to 80°C and stir for 6-16h. Pass the organic phase through column chromatography of alumina, rinse with chlorobenzene, r...
PUM
Property | Measurement | Unit |
---|---|---|
electrical resistance | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com