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Apparatus for treating and/or coating surface of substrate component

A substrate component and surface treatment technology, which is applied in coating, metal material coating process, vacuum evaporation plating, etc., can solve the problems of insufficient number of substrates or substrate components, failure to comply with supply time, etc.

Active Publication Date: 2014-02-12
居林无限责任公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Because the volume of the coating equipment is fixed due to the size of the coating container, and in order to fill the coating equipment 100%, the number of substrates or substrate assemblies requiring a specific coating type is often insufficient, and thus ultimately cannot Comply with the required supply times

Method used

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  • Apparatus for treating and/or coating surface of substrate component
  • Apparatus for treating and/or coating surface of substrate component
  • Apparatus for treating and/or coating surface of substrate component

Examples

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Embodiment Construction

[0028] These figures schematically show the components accommodated in the interior of a process chamber (not shown in detail) of a coating system, which are required for the coating of substrate components according to the PVD method or according to the reactive PVD method. of. In other words, the configuration groups shown in these figures are arranged in a coating or vacuum chamber that can be evacuated and that is preferably equipped with various gas connections. Vacuum chambers of this type are known, so that a precise description of the chamber can be omitted here. The coating plant to be described in more detail below is characterized by the possibility of being equipped with an evacuable deposition or treatment chamber in order to significantly increase the economical efficiency of operating such a plant and to minimize the process time of the plant due to the improved flexibility.

[0029] A modular design of the coating plant is chosen for this purpose. Around the ...

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PUM

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Abstract

Apparatus for treating and / or coating the surface of substrate components by deposition from the gas phase. A plurality of substrate carriers and a plurality of coating and / or treating units are arranged in a deposition or treatment chamber which can be evacuated. The system can be equipped in a modular fashion such that the substrate components introduced into the system in a batch can be subjected to different treatments. Method for treating and / or coating the surface of substrate components. The procedure comprises: a) compiling coating and / or treating units and shielding elements from modules in the deposition or treatment chamber; b) equipping the substrate carriers with those substrate components that are to be subjected to the same treatment; c) closing the deposition or treatment chamber; and d) carrying out the individual treatment or coating programs for the substrate components combined in groups on the substrate carriers in one batch.

Description

technical field [0001] The present invention relates to a kind of according to claim 1 or claim 14 preambles by vapor deposition, especially by the PVD method according to PVD method (Physical Vapor Deposition Physical Vapor Deposition) or the method for the physical vapor deposition of reactive formula Apparatus and method for surface treatment and / or surface coating of substrate assemblies. The application of very thin coatings, such as corrosion protection or wear protection, such as hard metal coatings, such as titanium-based hard alloy coating. Thin coatings of this type are often used in the manufacture of tools, especially in the manufacture of precision tools for cutting operations, such as drilling tools, milling tools or reamers. Background technique [0002] In the CVD (Chemical Vapor Deposition) process higher process temperatures of 900 to 1100° C. are used, while in the PVD process the process temperatures are considerably lower, ie approximately between 100 ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/35C23C14/56
CPCC23C16/54C23C14/35C23C14/56C23C14/564
Inventor M·菲德勒
Owner 居林无限责任公司
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