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Anti-reflection coating and super-hydrophobic self-cleaning anti-reflection coating and preparation method thereof

A kind of anti-reflection anti-reflection and self-cleaning technology, applied in the field of nanomaterial preparation, can solve the problems of limited applicable conditions, unsatisfactory durability, blocking orifices, etc., and achieve the effects of simple equipment, low cost, and easy industrialization

Inactive Publication Date: 2011-11-09
TECHNICAL INST OF PHYSICS & CHEMISTRY - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, these techniques all utilize TiO 2 The photocatalytic properties make the surface super-hydrophilic, and the applicable conditions will be limited, because the catalysis needs an environment with light; and although the surface of this porous structure can improve the hydrophilicity, it is easy to be absorbed by non-volatile substances or Nano dust blocks the orifice, and the durability is not ideal

Method used

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  • Anti-reflection coating and super-hydrophobic self-cleaning anti-reflection coating and preparation method thereof
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  • Anti-reflection coating and super-hydrophobic self-cleaning anti-reflection coating and preparation method thereof

Examples

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Embodiment 1

[0043] Anti-reflection coating: a layer of SiO with a particle size of 10-30nm 2 Nano particle composition, its preparation method comprises the following steps:

[0044] (1) Add 3-6mL of ammonia water and 50-150mL of absolute ethanol into the Erlenmeyer flask at room temperature and stir for 8-12 minutes, then stir for 1-3 minutes at 50-70 degrees Celsius, and add 2-4mL of ethyl orthosilicate dropwise under stirring Ester (TEOS), vigorously stirred at 50-70 degrees Celsius for 10-14 hours, a translucent suspension was obtained, which contained SiO with a diameter of 10-30nm 2 Spherical nanoparticle suspension, and diluting it into a suspension with a mass fraction of 0.1% to 1% for subsequent use;

[0045] (2) Immerse the common glass sheet into the newly prepared Pirhana solution (the H concentration is about 98%) 2 SO 4 with a mass concentration of about 30% H 2 o 2 7:3 mixed solution by volume) for 5 to 20 minutes, take it out, wash it with distilled water, and dry it...

Embodiment 2

[0051] Anti-reflection coating: four layers of SiO with a particle size of 10-30nm 2 Nano particle composition, its preparation method comprises the following steps:

[0052] (1) Add 3-6mL of ammonia water and 50-150mL of absolute ethanol into the Erlenmeyer flask at room temperature and stir for 8-12 minutes, then stir for 1-3 minutes at 50-70 degrees Celsius, and add 2-4mL of ethyl orthosilicate dropwise under stirring Ester (TEOS), continue to stir at 50-70 degrees Celsius for 10-14 hours to obtain a translucent suspension containing SiO with a diameter of 10-30nm 2 Spherical nanoparticle suspension, and diluting it into a suspension with a mass fraction of 0.1% to 1% for subsequent use;

[0053] (2) Immerse the common glass sheet into the newly prepared Pirhana solution (the H concentration is about 98%) 2 SO 4 with a mass concentration of about 30% H 2 o 2 7:3 mixed solution by volume) for 5 to 20 minutes, take it out, wash it with distilled water, and dry it with ni...

Embodiment 3

[0059] Anti-reflection coating: eight layers of SiO with a particle size of 10-30nm 2 Nano particle composition, its preparation method comprises the following steps:

[0060] (1) Add 3-6mL of ammonia water and 50-150mL of absolute ethanol into the Erlenmeyer flask at room temperature and stir for 8-12 minutes, then stir for 1-3 minutes at 50-70 degrees Celsius, and add 2-4mL of ethyl orthosilicate dropwise under stirring Ester (TEOS), continue to stir at 50-70 degrees Celsius for 10-14 hours to obtain a translucent suspension containing SiO with a diameter of 10-30nm 2 Spherical nanoparticle suspension, and diluting it into a suspension with a mass fraction of 0.1% to 1% for subsequent use;

[0061] (2) Immerse the common glass sheet into the newly prepared Pirhana solution (the H concentration is about 98%) 2 SO 4 with a mass concentration of about 30% H 2 o 2 7:3 mixed solution by volume) for 5 to 20 minutes, take it out, wash it with distilled water, and dry it with n...

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Abstract

The invention relates to an anti-reflection coating and a super-hydrophobic self-cleaning anti-reflection coating and a preparation method thereof. The anti-reflection coating is formed by a SiO2 ball-shaped nanoparticle layer with the particle size of 10-100 nm, and the surface of the coating has a rough structure. The super-hydrophobic self-cleaning anti-reflection coating is formed by providing a low surface energy substance on the surface of the anti-reflection coating, and the surface of the low surface energy substance has a rough structure. The coatings are obtained by using layer-by-layer electrostatic self-assembly technique. The light transmittance of the glass coated with the super-hydrophobic self-cleaning anti-reflection coating can increase to 99.1 from 91.3%, and the single-side reflectivity of the glass can reduce lowest to 0.3%. Compared with a solar cell coated with a common glass flake, a standard mono-silicon solar cell panel coated with a glass with the super-hydrophobic self-cleaning anti-reflection coating can utilize solar energy more effectively, and the efficiency can be improved to more than 6.6%.

Description

technical field [0001] The invention belongs to the technical field of nanomaterial preparation, in particular to an antireflection and antireflection coating and a superhydrophobic self-cleaning antireflection and antireflection coating as well as a preparation method and application thereof. Background technique [0002] Self-cleaning and anti-reflection and anti-reflection nanostructure coatings have a wide range of applications and huge markets in the fields of solar photovoltaic power generation, photovoltaic building materials, solar collectors, and aerospace. my country's demand for solar glass for solar water heaters alone reaches 100 million square meters. It is estimated that by 2030, photovoltaic power generation is expected to account for 5% to 20% of the world's power generation. In my country, in addition to application fields and technology demonstrations, national demonstration projects, Popular projects and international cooperation projects, power transmissi...

Claims

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Application Information

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IPC IPC(8): C03C17/23C03C17/34
Inventor 贺军辉李晓禹
Owner TECHNICAL INST OF PHYSICS & CHEMISTRY - CHINESE ACAD OF SCI
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