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Flow type precise automatic liquid supplementing device

An automatic rehydration device and precise technology, which are applied in the directions of cleaning methods, cleaning methods and utensils, chemical instruments and methods using liquids, etc., can solve the problems of great influence of human factors on the rehydration accuracy and inaccurate rehydration amount, etc., and achieve the concentration of the solution. The effect of maintaining stability, ensuring cleaning quality and improving use efficiency

Inactive Publication Date: 2011-09-07
EGING PHOTOVOLTAIC TECHNOLOGY CO LTD
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  • Description
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  • Application Information

AI Technical Summary

Problems solved by technology

Ordinary washing machines use manual addition method for rehydration, and manual addition has the defect of inaccurate rehydration volume, and human factors have a great influence on the accuracy of rehydration

Method used

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specific Embodiment approach

[0010] The flow-type precise automatic replenishment device includes a liquid storage tank 1, a mechanical replenishment pump 2, a constant pressure tank 3, an upper alarm sensor 4, an upper liquid level sensor 5, a lower liquid level sensor 6, a lower alarm sensor 7, Electromagnetic reversing valve 8, manual replenishment valve 9, manual calibration valve 10, measuring cup 11, cleaning tank 12 and control system 13, the liquid storage tank 1 is set next to the automatic silicon wafer cleaning machine, and the liquid storage tank 1 is stored for replenishment solution, a liquid filling opening is provided on the top of the liquid storage tank 1 for operators to add solution to it, the constant pressure tank 3 and the liquid storage tank 1 are connected by an acid and alkali resistant infusion tube 14, and the mechanical infusion pump 2 is set at Between the constant pressure tank 3 and the liquid storage tank 1, an upper alarm sensor 4, an upper liquid level sensor 5, a lower l...

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Abstract

The invention discloses a flow type precise automatic liquid supplementing device which comprises a liquid storage tank, a mechanical liquid supplementing pump, a constant-pressure tank, an upper alarm sensor, an upper liquid level sensor, a lower liquid level sensor, a lower alarm sensor, an electromagnetic reversing valve, a manual liquid supplementing valve, a manual calibration valve, a measuring jug, a cleaning tank and a control system, wherein the mechanical liquid supplementing pump is arranged between the constant-pressure tank and the liquid storage tank; the upper alarm sensor, the upper liquid level sensor, the lower liquid level sensor and the lower alarm sensor are sequentially arranged on the side wall of the constant-pressure tank from top to bottom and electrically connected with the control system; and a liquid supplementing pipe is divided into two branches through the electromagnetic reversing valve, wherein one branch is led into the cleaning tank through the manual liquid supplementing valve, and the other branch is led to the measuring jug through the manual calibration valve. The device can measure the flow of supplemented liquid, determine the liquid supplementing time according to the process requirements, and accurately supplement liquid to the cleaning tank in time so as to keep the concentration of a solution in the cleaning tank stable and fundamentally guarantee the cleaning quality of a silicon wafer.

Description

Technical field: [0001] The invention relates to a solar silicon chip cleaning device, in particular to a liquid replenishing device in a fully automatic cleaning device. Background technique: [0002] In the production process of solar cells, the cleaning process of silicon wafers is a very important process, and the cleaning quality directly affects the photoelectric conversion performance of solar cells. In the silicon wafer cleaning equipment, due to the chemical reaction between the silicon wafer and the cleaning solution, the relevant chemical components in the cleaning solution will be consumed. If it is not replenished in time, the cleaning effect of the silicon wafer will be directly affected. In order to improve the stability of the silicon wafer cleaning process, corresponding chemical liquid must be added to the cleaning solution after cleaning for a certain number of times. Ordinary washing machines use manual addition method for rehydration, and manual additio...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B08B3/08
Inventor 王瑞勋
Owner EGING PHOTOVOLTAIC TECHNOLOGY CO LTD
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