Method for improving roughness of line edge of photoetching pattern in semiconductor process
A technology of edge roughness and photolithographic patterns, which is applied in the field of semiconductor manufacturing technology, can solve problems such as complex process, lower device yield, and increase production cost, and achieve the effect of simple process, improved line edge roughness, and low cost
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[0029] In the following description, numerous specific details are given in order to provide a more thorough understanding of the present invention. It will be apparent, however, to one skilled in the art that the present invention may be practiced without one or more of these details. In other examples, some technical features known in the art are not described in order to avoid confusion with the present invention.
[0030] In order to thoroughly understand the present invention, detailed steps will be presented in the following description to illustrate how the present invention utilizes the photoresist stabilization injection process to improve the line edge roughness of the pattern. Obviously, the practice of the invention is not limited to specific details familiar to those skilled in the semiconductor arts. Preferred embodiments of the present invention are described in detail below, however, the present invention may have other embodiments besides these detailed descr...
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