Ion implantation system and method for improving beam current intensity and angle distribution
A technology of ion implantation system and angular distribution, which is applied in the field of ion implantation system and improving beam current intensity and angular distribution, can solve problems such as beam loss, achieve improved current intensity and angular distribution, high beam transmission efficiency, reduce Effect of beam loss
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0021] The preferred embodiments of the present invention are given below in conjunction with the accompanying drawings to describe the technical solution of the present invention in detail.
[0022] Such as figure 2 As shown, the ion implantation system of the present invention includes: an ion source 101 and an extracting system 102, the extracting system 102 is used to extract the ion beam diverging from the ion source 101; a mass analysis magnet 103 is used to extract from the ion beam An ion beam within a preset energy range is selected from the ion beams of the system 102; a beam uniformity controller 104 is used to adjust the longitudinal density distribution of the ion beam within the preset energy range from the mass analysis magnet 103; A calibrator 105 is arranged at the lateral focal point of the mass analysis magnet 103, and is used to make the ion beams in the preset energy range from the beam uniformity controller 104 terminate the divergence trend, become para...
PUM
![No PUM](https://static-eureka-patsnap-com.libproxy1.nus.edu.sg/ssr/23.2.0/_nuxt/noPUMSmall.5c5f49c7.png)
Abstract
Description
Claims
Application Information
![application no application](https://static-eureka-patsnap-com.libproxy1.nus.edu.sg/ssr/23.2.0/_nuxt/application.06fe782c.png)
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap