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PEEK-modified phenol formaldehyde resin and preparation method thereof

A polyether ether ketone and phenolic resin technology, applied in the field of phenolic resin and its preparation, can solve problems such as good solvent resistance, and achieve the effects of improving toughness, improving heat resistance, improving heat resistance and fracture toughness

Active Publication Date: 2013-02-06
NORTHWESTERN POLYTECHNICAL UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The current problem is that polyetheretherketone has good solvent resistance and is difficult to react with other reagents. If it can be modified from the molecular structure of polyether ether ketone, active functional groups can be introduced into the molecule to improve the polyetheretherketone reactivity, allowing it to be attached to phenolic resins

Method used

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  • PEEK-modified phenol formaldehyde resin and preparation method thereof
  • PEEK-modified phenol formaldehyde resin and preparation method thereof
  • PEEK-modified phenol formaldehyde resin and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] Step 1: Add the dried polyether ether ketone into the flask containing the sulfonating agent, under N 2 Stir quickly under protection, react at room temperature for 24 hours, and let it settle;

[0030] Step 2: vacuum filter the sediment, repeatedly wash the sulfonated polyetheretherketone with deionized water until the filtrate is neutral, and dry in vacuum; the sulfonating agent is concentrated sulfuric acid;

[0031] Step 3: Add the dried sulfonated polyether ether ketone into the flask containing the chloromethylation reagent, stir rapidly and raise the temperature to 60°C for 6 hours, and let it settle; the chloromethylation reagent is chloromethyl ether ;

[0032] Step 4: vacuum filter the sediment, repeatedly wash the sulfonated chloromethylated polyetheretherketone with deionized water until the filtrate is neutral, and dry it in vacuum;

[0033] Step 5: In a reactor equipped with a reflux condenser, add 100 parts of phenol under stirring conditions and heat a...

Embodiment 2

[0038] Step 1: Add the dried polyether ether ketone into the flask containing the sulfonating agent, under N 2 Stir rapidly under protection, react at room temperature for 24 hours, let stand and settle; the sulfonating agent is chlorosulfonic acid;

[0039] Step 2: Vacuum filter the precipitate, repeatedly wash the sulfonated polyetheretherketone with deionized water until the filtrate is neutral, and dry it in vacuum;

[0040] Step 3: Add the dried sulfonated polyether ether ketone into the flask containing the chloromethylation reagent, stir rapidly and raise the temperature to 60°C for 6 hours, and let it settle; the chloromethylation reagent is chloromethyl Alkyl ether;

[0041] Step 4: vacuum filter the sediment, repeatedly wash the sulfonated chloromethylated polyetheretherketone with deionized water until the filtrate is neutral, and dry it in vacuum;

[0042] Step 5: In a reactor equipped with a reflux condenser, add 100 parts of phenol under stirring conditions and...

Embodiment 3

[0047] Step 1: Add the dried polyether ether ketone into the flask containing the sulfonating agent, under N 2 Stir rapidly under protection, react at room temperature for 24 hours, let stand and settle; the sulfonating agent is a 3:2 mixture of methanesulfonic acid and concentrated sulfuric acid;

[0048] Step 2: vacuum filter the sediment, repeatedly wash the sulfonated polyether ether ketone with deionized water until the filtrate is neutral, and dry it in vacuum;

[0049]Step 3: Add the dried sulfonated polyether ether ketone into the flask containing the chloromethylation reagent, stir rapidly and raise the temperature to 60°C for 6 hours, and let it settle; the chloromethylation reagent is 2:1 Formaldehyde and hydrochloric acid mixture;

[0050] Step 4: vacuum filter the sediment, repeatedly wash the sulfonated chloromethylated polyetheretherketone with deionized water until the filtrate is neutral, and dry it in vacuum;

[0051] Step 5: In a reactor equipped with a re...

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Abstract

The invention relates to a polyetheretherketone-modified phenol formaldehyde resin and a preparation method thereof. The polyetheretherketone-modified phenol formaldehyde resin is technically characterized by comprising the following components: 100 parts of phenol, 40 to 50 parts of solid formaldehyde, 1 to 10 parts of polyetheretherketone, a catalyst, a sulfonating agent and a chloromethylating agent. Through reaction, an active group is introduced into the molecular structure of the polyetheretherketone, and the polyetheretherketone having the active group undergoes copolymerization with phenol formaldehyde resin to form the polyetheretherketone-modified phenolic resin. The invention has the advantages that: without sewage discharge, a synthesis process is safe and environmentally-friendly; and the obtained polyetheretherketone-modified phenol formaldehyde resin has higher heat resistance than unmodified phenolic resin, the ductility of the product of periodic heating solidification is improved by about 30 percent, and the polyetheretherketone-modified phenol formaldehyde resin demonstrates typical ductile rupture.

Description

technical field [0001] The present invention relates to a phenolic resin modified by polyetheretherketone and its preparation method, mainly using phenol, formaldehyde, polyether ether ketone, catalyst, sulfonating agent, chloromethylation reagent, etc. preparation. Background technique [0002] Phenol formaldehyde resin (PF) is the earliest synthetic resin to be industrialized. Because of its easy-to-obtain raw materials, low price, mature production technology and equipment, and good comprehensive performance, it has a wide range of uses. However, phenolic resin also has the disadvantages of high brittleness, high shrinkage, no alkali resistance, easy moisture absorption and poor electrical properties. Unmodified phenolic resin can be used stably below 200°C. If it exceeds 200°C, it will obviously oxidize; it will enter the thermal decomposition stage from 340-360°C; it will completely degrade at 600-900°C, releasing CO, CO 2 、H 2 O, phenol and other substances. Usuall...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C08G81/00C08G8/28C08G8/10C08G65/48
Inventor 齐暑华刘乃亮理莎莎吴江涛李美玲李春华
Owner NORTHWESTERN POLYTECHNICAL UNIV
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