Photopolymerization initiator and photosensitive composition

A technology of photopolymerization initiator and photosensitive composition, applied in optics, optomechanical equipment, instruments, etc., can solve the problems of contaminating the calciner, damaging the reliability of color filters, etc.

Inactive Publication Date: 2015-05-20
NIPPON STEEL CHEMICAL CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At this time, the photopolymerization initiator remaining in the photoresist will be thermally decomposed, and sometimes the resulting decomposition product will contaminate the calciner and damage the reliability of the color filter

Method used

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  • Photopolymerization initiator and photosensitive composition
  • Photopolymerization initiator and photosensitive composition
  • Photopolymerization initiator and photosensitive composition

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0044] (9-ethyl-6-nitrocarbazol-3-yl)(4-nitrophenyl)methanone=O-acetyl oxime (photopolymerization initiator of formula (3))

[0045] Synthesis of photopolymerization initiator

[0046] The above-mentioned photopolymerization initiator is synthesized through the reaction of 4 steps below. The reaction was carried out under normal pressure using a glass reactor.

[0047] Step 1: Using nitromethane as a solvent, make 0.10 mol of 9-ethylcarbazole (manufactured by Tokyo Chemical Industry Co., Ltd.), 0.15 mol of 4-nitrobenzoyl chloride (manufactured by Tokyo Chemical Industry Co., Ltd.), and 0.15 mol of aluminum chloride in React at 0 to 5°C for 6 hours. The reaction solution was dropped into ice water, and the precipitated solid was collected and washed thoroughly to obtain a crude product corresponding to 0.07 mol of (9-ethylcarbazol-3-yl)(4-nitrophenyl)methanone .

[0048] Step 2: Using acetic acid as a solvent, react the whole amount of the product in Step 1 and 0.14 moles o...

Embodiment 2

[0057] (9-hexyl-6-nitrocarbazol-3-yl)(4-nitrophenyl)methanone=O-acetyl oxime (photopolymerization initiator of formula (4))

[0058] Synthesis was carried out in the same manner as in Example 1. by 1 H-NMR (CDCl 3 ) when carrying out the identification of gained pure product compound, show following result.

[0059] δ=8.92(s, 1H), 8.49(d, 1H), 8.47(d, 2H), 8.14(s, 1H), 7.96(d, 1H), 7.61(d, 2H), 7.48(d, 1H) , 7.46(d, 1H), 4.30(q, 2H), 2.12(s, 3H), 1.90-1.83(m, 2H), 1.43-1.35(m, 2H), 1.35-1.23(m, 4H), 0.86 (t,3H)

[0060] In addition, a photosensitive composition was produced and evaluated in the same manner as in Example 1, and the exposure amount required for photohardening was 26 mJ / cm 2 .

Embodiment 3

[0062] (9-(2-ethylhexyl)-6-nitrocarbazol-3-yl)(4-nitrophenyl)methanone=O-acetyl oxime (photopolymerization initiator of formula (5))

[0063] Synthesis was carried out in the same manner as in Example 1. by 1 H-NMR (CDCl 3 ) when carrying out the identification of gained pure product compound, show following result.

[0064] δ=8.93(s, 1H), 8.46(d, 2H), 8.41(d, 1H), 8.15(s, 1H), 7.95(d, 1H), 7.60(d, 2H), 7.48(d, 1H) , 7.45(d, 1H), 4.17(q, 2H), 2.16(s, 3H), 2.07(m, 1H), 1.45-1.30(m, 4H), 1.30-1.26(m, 4H), 0.92(t ,3H), 0.86(t,3H)

[0065] In addition, a photosensitive composition was produced and evaluated in the same manner as in Example 1, and the exposure amount required for photohardening was 26 mJ / cm 2 .

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Abstract

The present invention provides a photopolymerization initiator with high sensitivity and excellent thermal stability, and a photosensitive composition. The photopolymerization initiator is represented with a general formula (1): wherein, R1 represents an aryl with at least one nitryl as a substituting group, additionally, R2 is a saturated or unsaturated 1-value organic group which can comprise a substituting group and has 1-20 carbon atoms, R2 can comprise a branched structure or a ring structure and can also be provided with a hetero atom at a random position. Furthermore, Ar is a substituting group with a carbazole frame which comprises nitryls.

Description

technical field [0001] The present invention relates to a novel photopolymerization initiator, a photosensitive composition containing the photopolymerization initiator, and a cured product thereof. Background technique [0002] Photosensitive compositions are widely used in the form of compounding a photopolymerization initiator in a polymerizable compound having an olefin bond, and are used in photoresists, photocurable printing inks, photocurable coatings, photocurable adhesives, and photosculpting It is practically used for photosensitive resins and photosensitive printing plates. Although the photosensitive composition can be polymerized and cured by irradiating ultraviolet light or visible light (called exposure) with a mercury lamp, xenon lamp, laser, etc. A photosensitive composition requires a high-sensitivity photopolymerization initiator. [0003] In terms of photopolymerization initiators, many compounds have been reported so far, such as known acetophenone (ac...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C08F2/48G03F7/027
CPCC08K5/32C08L33/12G03F7/028G03F7/031
Inventor 今野高志山田裕章
Owner NIPPON STEEL CHEMICAL CO LTD
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