Photovoltaic organic ultraviolet semiconductor detector
A detector and semiconductor technology, which is applied in the field of organic ultraviolet semiconductor detectors, can solve the problems of difficult photovoltaic detection, high cost of inorganic ultraviolet detectors, and inability to realize flexible substrate detection, etc. It achieves low power consumption, easy formation of arrays, and modulation wide range of effects
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Embodiment 1
[0029] Embodiment 1: a kind of bottom detection photovoltaic type organic ultraviolet semiconductor detector, with quartz plate as substrate 1, the AZO of 150nm is deposited on substrate 1 with the method for thermal evaporation, forms high work function electrode layer 2; Alkanes and DMF dissolve the fluorene polymer, spin-coat 100nm fluorene polymer on the high work function electrode layer 2 with a homogenizer to form the organic ultraviolet semiconductor layer 3; finally use thermal evaporation technology to deposit 150nm Mg:Ag alloy to form Low work function electrode layer 4 .
Embodiment 2
[0030] Embodiment 2: a kind of top detection photovoltaic type organic ultraviolet semiconductor detector, with quartz sheet as substrate 1, the Nb of 150nm is deposited on substrate 1 with magnetron sputtering method to form low work function electrode layer 4, then use heat 100nm fluorene was deposited by evaporation technology to form organic ultraviolet semiconductor layer 3 , and finally 150nm ITO was deposited by magnetron sputtering to form high work function electrode layer 2 .
Embodiment 3
[0031] Embodiment 3: a kind of bottom detection photovoltaic type organic ultraviolet semiconductor detector, with quartz plate as substrate 1, the ITO of 200nm is deposited on substrate 1 with the method for magnetron sputtering, forms high work function electrode layer 2, then Deposit 10nm NPD sequentially by thermal evaporation to form a hole transport layer 6, 100nm phenanthrene, and form an organic ultraviolet semiconductor layer 3, 10nm Alq 3 An electron transport layer 5 is formed, and finally a 150nm Mg:Ag alloy is deposited by thermal evaporation to form a low work function electrode layer 4 .
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