Method for preparing metal sulfide diamond-like carbon composite film
A technology of metal sulfide and composite film, which is applied in the field of preparation of composite film technology, can solve the problems of unfavorable friction and wear performance, low sulfur content of composite film, etc.
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Embodiment 1
[0040] Firstly, ultrasonic cleaning technology is used to remove the contamination layer on the surface of the cemented carbide tool; the surface of the tool is bombarded and cleaned by the argon ion beam generated by the ion source of the anode layer; and then the titanium ion generated by the circular cathode arc source is used to The surface of the tool is cleaned by ion bombardment; then the Ti / TiN / TiCN / TiC gradient transition layer is prepared by cathodic arc deposition. The cathodic arc target material is Ti, and argon, argon / nitrogen mixed gas, nitrogen, and nitrogen are successively introduced into the vacuum chamber / methane mixed gas, methane, the negative bias of the workpiece is -100~-800V; use ion beam deposition + magnetron sputtering to synthesize a DLC film doped with W and Mo at the same time, the ion source adopts the anode layer ion source, and passes into the anode layer The gas of the ion source includes argon and methane, and the magnetron sputtering targe...
Embodiment 2
[0042] First, use ultrasonic cleaning technology to remove the surface contamination layer of high-speed steel mold; use the anode layer ion source to bombard the surface of the mold with argon ion beam; The surface is cleaned by ion bombardment; then the Cr / CrN / CrCN / CrC gradient transition layer is prepared by cathodic arc deposition. The cathodic arc target material is Cr, and argon, argon / nitrogen mixed gas, nitrogen, nitrogen / Methane mixed gas, methane, workpiece negative bias is -100 ~ -800V; use ion beam deposition + magnetron sputtering to synthesize DLC film doped with W, the ion source uses the anode layer ion source, and the gas that passes into the anode layer ion source Including argon and methane, the magnetron sputtering target adopts a DC magnetron sputtering target, and the target material is W; finally, WS is prepared by ion vulcanization 2 The DLC composite film adopts the pulse bias voltage of -500V~-600V, the gas in the vacuum chamber is ammonia gas, the p...
Embodiment 4
[0044]First, use ultrasonic cleaning technology to remove the contamination layer on the surface of the bearing steel; then use the anode layer ion source to bombard the surface of the bearing steel with argon / hydrogen mixed ion beam; then use the anode layer ion source to assist intermediate frequency magnetron sputtering deposition to prepare Zr / ZrN / ZrCN / ZrC gradient transition layer, the magnetron sputtering target material is Zr, the gas passing into the anode layer ion source includes argon, argon / acetylene mixed gas, and the ion energy of the ion beam is -1000~-2000eV; Beam deposition + magnetron sputtering synthesizes a DLC film doped with W and Fe at the same time. The ion source adopts the anode layer ion source, and the gas flowing into the anode layer ion source includes argon and methane. The magnetron sputtering target adopts DC magnetron sputtering Target shooting, the target material is W, Fe. Finally, WS was prepared by ion vulcanization 2 / FeS DLC composite ...
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