Black photo resist and preparation method and picture composition method thereof

A black photoresist, unsaturated technology, applied in optomechanical equipment, photosensitive materials for optomechanical equipment, optics, etc., can solve the problems of limited metal chromium resources, serious environmental pollution, etc., to improve photosensitivity and polymerization speed. , the surface morphology is good, the effect of improving the dispersion efficiency

Inactive Publication Date: 2010-06-16
BOE TECH GRP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the use of metal chromium materials is more serious to environmental pollution, and the resources of metal chromium are relatively limited. Therefore, it is urgent to develop a material that can replace metal chromium as a material that can be used to prepare black matrices.

Method used

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  • Black photo resist and preparation method and picture composition method thereof
  • Black photo resist and preparation method and picture composition method thereof
  • Black photo resist and preparation method and picture composition method thereof

Examples

Experimental program
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no. 1 example

[0036]In this embodiment, the main components of the black photoresist are shown in column "1" of the embodiment in Table 1. The black photoresist of this embodiment comprises: the Regal 250 black pigment that is 12% by weight, the Solsperse 32600 dispersant that is 19.5% by weight, the SYNERGIST 5000 auxiliary dispersant that is 4% by weight, the ACAZ 200 that is 6.5% by weight and The dispersion resin that is the CN2279 mixing of 1% by weight, the PMA that is 16% by weight and the organic solvent that EEP is mixed of 15% by weight, the SB 401 alkali-soluble resin that is 18% by weight, the SB 401 alkali-soluble resin that is 2% by weight DPHA mixed with 0.5% by weight of EB 350 ethylenically unsaturated monomer, 1.2% by weight of DEN 438 epoxy resin, 1.2% by weight of Ciba 379 and 2.8% by weight of CGI 242 photoinitiator, and 0.3% by weight of antioxidants, wetting agents and other additives.

[0037] After testing, the particle size (average particle size) of the black pho...

no. 5 example

[0048] In this embodiment, the main components of the black photoresist are shown in column "5" of the embodiment in Table 1. The black photoresist of this embodiment comprises: 10.5% by weight of Regal 250 and 1.5% by weight of P.B 15:2 mixed black pigment, 18% by weight of Solsperse 32600 dispersant, 4.5% by weight of CN2279 dispersion Resin, 41% by weight of PMA organic solvent, 18% by weight of SB 401 alkali-soluble resin, 0.5% by weight of DPHA and 0.5% by weight of EB 350 mixed ethylenically unsaturated monomers, 1.2% by weight of DEN 438 epoxy resin, 4% by weight of CGI 242 mixed photoinitiator, and 0.3% by weight of antioxidants, wetting agents and other additives.

[0049] After testing, the particle size (average particle size) of the black photoresist in this embodiment is 44nm, and the storage stability is high.

[0050] Further, in each embodiment of the above-mentioned black photoresist, the black pigment may include: carbon black or perylene black, or a mixture...

no. 1 example preparation

[0091]The main components of the first embodiment of the black photoresist are shown in column "1" of the embodiment in Table 1. In the first embodiment of the black photoresist of the present invention, a mixed solvent of 16% by weight of PMA and 15% by weight of EEP is selected as the organic solvent, these organic solvents are divided into three parts for use, and 1 / 6 of the organic solvent is measured As the first organic solvent, measure 1 / 3 of the organic solvent as the second organic solvent, and the remaining organic solvent as the third organic solvent. The preparation method of the first embodiment of the black photoresist of the present invention is as follows:

[0092] Step 111, uniformly mix the dispersion resin mixed with 6.5% by weight of ACAZ 200 and 1% by weight of CN2279 with the first part of organic solvent to prepare a dispersion resin solution; the first part of organic solvent It is: 1 / 6 of the organic solvent with a weight percentage of 25% to 80%;

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Abstract

The invention relates to a black photo resist and a preparation method and a picture composition method thereof. The black photo resist comprises 5 to 45 weight percent of black pigment, 0.5 to 67 weight percent of dispersing agent, 0 to 5 weight percent of auxiliary dispersing agent, 0.05 to 30 weight percent of dispersion resin, 0.05 to 30 weight percent of alkaline soluble resin, 2 to 22 weight percent of unsaturated vinyl monomer, 0.05 to 10 weight percent of epoxy resin, 25 to 80 weight percent of organic solvent, 0.15 to 10 weight percent of photoinitiator and 0.01 to 2 weight percent of additive. The black photo resist has the advantages of small granularity, narrow particle size distribution range and high storage stability, can meet the requirement of material selection of a black matrix of an optical filter, and is favorable for improving the display quality of display products comprising the black matrix of the optical filter.

Description

technical field [0001] The invention relates to a black photoresist, a preparation method and a patterning method thereof, in particular to a black photoresist which can be used for preparing a black matrix of an optical filter, a preparation method and a patterning method thereof. Background technique [0002] Color filters are the key components for liquid crystal displays to realize color display. The performance of the color filter mainly depends on the performance of the pigment photoresist and the film-forming process of the color filter. It is usually necessary to form red (R), green (G) and blue (B) three-color pixels on the color filter for preparing liquid crystal displays, and it is also necessary to form a black matrix between the three-color pixels to improve Improves the contrast of LCD displays and prevents color mixing between pixels of different colors. Therefore, the research and development focus of the development of photoresist materials for color filt...

Claims

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Application Information

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IPC IPC(8): G03F7/004G03F7/028G03F7/00
Inventor 杨久霞赵吉生白峰
Owner BOE TECH GRP CO LTD
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