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Method for preparing rotary ceramic target

A technology for ceramic targets and target precursors, applied in metal material coating process, ion implantation plating, coating, etc., can solve the problem of total production cost that affects production efficiency, users cannot continuously produce for a long time, and difficult to rotate ceramics. Targets and other issues, to achieve the effect of improving continuous production capacity, extending target time, and reducing production costs

Inactive Publication Date: 2010-05-12
上海高展金属材料有限公司 +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] The existing production process of rotating ceramic targets usually adopts spraying methods, including thermal spraying and plasma spraying. However, due to the limitations of spraying processes, it is currently difficult to produce rotating ceramic targets with thicker wall thickness by spraying. At present, the maximum wall thickness of the rotary ceramic sputtering target produced by spraying is only about 9 mm
This will cause the user to not be able to produce continuously for a long time, requiring frequent shutdowns to replace equipment, which will affect production efficiency and increase the total production cost

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0020] Example 1: Rotating Zinc Oxide Aluminum ZnO / Al 2 o 3 Sputtering target

[0021] Zinc oxide powder with a purity of 99.95% (accounting for 95% of the total mass) and aluminum oxide powder with a purity of 99.99% (accounting for 2.0% of the total mass) are uniformly mixed with each other by ball milling, and the fully mixed zinc oxide and aluminum mixed powder is passed through Cold isostatic pressing forms a rotating zinc oxide aluminum target precursor with an outer diameter of 160 mm, an inner diameter of 125 mm, a height of 300 mm, and a density of 60%. % of the rotating zinc oxide aluminum target precursor is put into the sintering furnace, and after 70 hours, it is sintered and dense at 1200°C.

[0022] Analysis results:

[0023] By using the Archimedes method to measure the density of the sintered dense ZnO rotating target, the relative density is 95%;

[0024] The obtained spin zinc aluminum oxide ZnO / Al 2 o 3 The sputtering target thickness is 17 mm.

Embodiment 2

[0025] Example 2: Rotating NbOx sputtering target

[0026] The niobium pentoxide powder (accounting for 99% of the total mass) with a purity of 99.95% and the metal niobium powder (accounting for 1% of the total mass) with a purity of 99.99% are mixed uniformly by ball milling, and the fully mixed niobium pentoxide and Put the mixed powder of metal niobium into the mold and form a rotating NbOx target precursor with an outer diameter of 160 mm, an inner diameter of 125 mm, a height of 300 mm, and a density of 65% through cold isostatic pressing at a pressure of 150 MPa and a pressing time of 20 minutes; The rotating niobium pentoxide target precursor with a density of 65% formed by isostatic pressing was placed in a sintering furnace, and after 60 hours, it was sintered and dense at 1100°C.

[0027] Analysis results:

[0028] The density of the nearly sintered dense target is measured by the Archimedes method, and its relative density is 92%;

[0029] By using XRD to analyze...

Embodiment 3

[0031] Example 3: Rotating TiOx sputtering target

[0032] Titanium dioxide powder (accounting for 98% of the total mass) with a purity of 99.5% and metal titanium powder (accounting for 2.0% of the total mass) with a purity of 99.5% are uniformly mixed with each other by ball milling, and the mixed powder of fully mixed titanium dioxide and titanium metal Put into the mold and form a rotating TiOx target precursor with an outer diameter of 160 mm, an inner diameter of 125 mm, a height of 300 mm, and a density of 70% through cold isostatic pressing with a pressure of 160Mpa and a pressing time of 45 minutes; The rotating TiOx target precursor with a density of 70% formed by isostatic pressing was put into a sintering furnace, and after 65 hours, it was sintered and dense at 1150°C.

[0033] Analysis results:

[0034] The density of the nearly sintered dense target is measured by the Archimedes method, and its relative density is 97%;

[0035] By using XRD to analyze the near...

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Abstract

The invention relates to the technical field of films, in particular to a method for preparing a rotary ceramic target, which comprises the following steps: (1) preparing a precursor of the target, namely weighting metal oxide powder of which the purity is not less than 99 weight percent, putting the powders into a mould for cold isostatic pressing to prepare the precursor of the target, wherein the reaction pressure is between 130 and 230 MPa, and the reaction time is between 20 and 70 minutes; and (2) sintering, namely putting the precursor of the target obtained in the step (1) into a sintering furnace for sintering densification, wherein the sintering temperature is between 1,000 and 1,600 DEG C, and the sintering time is between 40 and 85 hours. The wall thickness of rotary ceramic target prepared by the method is multiple times that of a plane target, so that the time of using the target continuously by customers is prolonged, the continuous productive power is improved and the total production cost is reduced.

Description

technical field [0001] The invention relates to the field of thin film technology, in particular to a method for preparing a rotating ceramic target. Background technique [0002] The existing production process of rotating ceramic targets usually adopts spraying methods, including thermal spraying and plasma spraying. However, due to the limitations of spraying processes, it is currently difficult to produce rotating ceramic targets with thicker wall thickness by spraying. At present, the maximum wall thickness of the rotary ceramic sputtering target produced by spraying is only about 9 mm. This will cause users to not be able to produce continuously for a long time, and frequent shutdowns are required to replace equipment, thereby affecting production efficiency and increasing total production costs. Contents of the invention [0003] The object of the present invention is to provide a method for preparing a rotating ceramic target, which has a simple process, and the p...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/08C23C14/34C23C14/06C04B35/64
Inventor 庄维新庄志杰
Owner 上海高展金属材料有限公司
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