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A method and device for sealing electrodes in a hydrogenation furnace device for polysilicon production

A technology of hydrogenation furnace and polysilicon, which is applied in the growth of polycrystalline materials, chemical instruments and methods, crystal growth, etc., can solve the problems of hydrogen easy to cause fire, short circuit of electrodes and chassis, insulation failure, etc., to improve conversion rate and production The effect of improving efficiency, increasing working pressure and prolonging service life

Active Publication Date: 2011-12-07
YICHANG CSG POLYSILICON CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, polytetrafluoroethylene materials can only be used safely below 250°C. In the hydrogenation furnace, silicon tetrachloride and hydrogen undergo hydrogenation reaction at a high temperature of 1150-1250°C. Although the chassis is cooled by jacketed cooling water, the electrodes are insulated. The temperature at the place still exceeds 250°C. If the PTFE material is plastically deformed or burnt and carbonized due to high temperature during the production process, its insulation function may fail, and the electrode and the chassis may contact to cause a short circuit, which will easily lead to hydrogenation. Furnace explosion and leaked hydrogen are also likely to cause fire and other safety accidents

Method used

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  • A method and device for sealing electrodes in a hydrogenation furnace device for polysilicon production
  • A method and device for sealing electrodes in a hydrogenation furnace device for polysilicon production

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Embodiment Construction

[0021] Such as figure 1 As shown, a method for sealing electrodes in a hydrogenation furnace device for polysilicon production, a zirconia ceramic sealing device, a flexible graphite sealing ring and an O-ring are set between the electrode 1 and the chassis 14 to jointly realize high temperature resistance, insulation and Sealing, tighten the stainless steel nut 10, the electrode 1 and the chassis 14 and the glass fiber bushing 9 are tensioned, so that the flexible graphite sealing ring, the O-ring and the polytetrafluoroethylene backing ring 7 are pressed and deformed to form a seal, and at the same time, the electrode 1 into the cooling water.

[0022] A device for sealing electrodes in a hydrogenation furnace device for polysilicon production, including a chassis 14, an electrode 1 is connected to the chassis 14 through a stainless steel nut 10, a boss is arranged under the top of the electrode 1, and a quartz tube 4, Flexible graphite sealing ring 2, zirconia ceramic insu...

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Abstract

The invention discloses a method for sealing electrodes in a hydrogenation furnace device for polysilicon production, and relates to a hydrogenation furnace electrode device for polysilicon production. The electrodes are connected with cooling circulating water, and special zirconia ceramics, flexible graphite and fluororubber are used. Various materials such as O-ring sealing ring and other materials solve the problems of high temperature resistance, insulation and sealing between the electrode and the chassis, improve the reliability of the hydrogenation furnace device, ensure the safe operation of the hydrogenation furnace device, and improve the safety of the hydrogenation furnace device. Productivity.

Description

technical field [0001] The invention relates to a hydrogenation furnace electrode for polysilicon production, in particular to a method and device for sealing electrodes in a hydrogenation furnace device for polysilicon production. Background technique [0002] The electrode sealing structure on the inner chassis of the hydrogenation furnace device for polysilicon production designed by the Russian Institute of Rare Metals uses polytetrafluoroethylene materials to achieve the following functions: During the hydrogenation reaction of silicon tetrachloride and hydrogen at high temperatures, both It plays the role of insulation, but also plays the role of absolutely reliable sealing. However, polytetrafluoroethylene materials can only be used safely below 250°C. In the hydrogenation furnace, silicon tetrachloride and hydrogen undergo hydrogenation reaction at a high temperature of 1150-1250°C. Although the chassis is cooled by jacketed cooling water, the electrodes are insulate...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C01B33/03C30B29/06F16J15/10
Inventor 曾南谢文成吴学林
Owner YICHANG CSG POLYSILICON CO LTD
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