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Masstone photomask and pattern transfer method using the same

A photomask, multi-tone technology, applied in the direction of originals for photomechanical processing, optics, photomechanical equipment, etc., can solve problems such as insufficiency

Inactive Publication Date: 2009-09-30
HOYA CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Therefore, it is not sufficient to define this transmittance merely by representing the wavelength

Method used

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  • Masstone photomask and pattern transfer method using the same
  • Masstone photomask and pattern transfer method using the same
  • Masstone photomask and pattern transfer method using the same

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Experimental program
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Embodiment Construction

[0057] Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

[0058] So far, in the management of multi-color photomasks, the transmittance of the semi-permeable film constituting the semi-transparent region is specified by the inherent transmittance of the film, regardless of the pattern shape, which is Determined by the film and representative wavelength (eg g-line). In the case of setting the material and thickness of the semi-permeable film according to the transmittance specified in this way, when the area of ​​the semi-transparent region is sufficiently large relative to the resolution of the exposure machine, and the wavelength of the exposure light is equal to the representative wavelength, no special problems arise. However, when the area or width of the semi-transparent region is very small relative to the resolution of the exposure machine, due to the influence of the light-shielding part or the light-transmi...

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PUM

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Abstract

The present invention relates to a masstone photomask and pattern transfer method using the same. The masstone photomask forms transfer pattern having a transparent zone, a light shading zone and a semi-transparent zone by using a photomask (23) arranged on a transparent substrate (21) to shade exposure light and a semi-transparent film (22) for the exposure light. An optical system with value hole diameter of 0.08 and degree of coherence of 0.8 receives exposure light with g ray, h ray and i ray of 1:1:1 through the semi-transparent zone and calculates effective transmission rate of the semi-transparent zone, herein mask surface internal distribution range of effective transmission rate of the semi-transparent zone is lower than 2.0%.

Description

technical field [0001] The present invention relates to a multi-color photomask used in a photolithography process and a pattern transfer method using the multi-color photomask. Background technique [0002] Conventionally, in the manufacture of electronic devices such as liquid crystal devices, one of the steps is to form a resist pattern by photolithography. That is, a photomask having a predetermined pattern is used to expose a resist film formed on a layer to be etched to be etched under predetermined exposure conditions to transfer the pattern, and the resist film is developed to form resist pattern. Then, using this resist pattern as a mask, the layer to be processed is etched. [0003] As one of such photomasks, there is known a multi-tone photomask having a light-shielding region that blocks exposure light, a light-transmitting region that transmits exposure light, and a half region that transmits a part of exposure light. Translucent area. This multi-color photo...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/00G03F7/00H01L21/027G03F1/58G03F1/54G03F1/68
CPCG03F1/36G03F1/54G03F1/58G03F1/84
Inventor 吉田光一郎
Owner HOYA CORP
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