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Vertical measuring system capable of adjusting zero-plane position

A measurement system and plane position technology, applied in the field of measurement systems, can solve the problems of inability to eliminate vertical measurement errors, non-adjustment, etc., and achieve the effects of simple structure, fast adjustment speed, and improved measurement accuracy

Inactive Publication Date: 2009-09-09
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the zero plane position of this scheme cannot be adjusted, and the vertical measurement error caused by the drift of the best focal plane of the projection objective cannot be eliminated.

Method used

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  • Vertical measuring system capable of adjusting zero-plane position
  • Vertical measuring system capable of adjusting zero-plane position
  • Vertical measuring system capable of adjusting zero-plane position

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Embodiment Construction

[0036] In order to better understand the technical content of the present invention, specific embodiments are given together with the attached drawings for description as follows.

[0037] figure 1 It is a structural schematic diagram of the vertical measurement system in a preferred embodiment of the present invention.

[0038] This embodiment discloses a vertical measurement system that can automatically adjust the position of the zero plane, which can be used as a vertical measurement sensor for a photolithography machine. Such as figure 1 As shown, the vertical measurement system disclosed in this embodiment is suitable for lithography equipment.

[0039] The lithography equipment includes components such as a projection objective lens 1 and a workbench 8 . The measured silicon wafer 7 is placed on the workbench 8 . The workbench 8 can drive the silicon wafer 7 to move vertically and horizontally.

[0040] The vertical measurement system includes a light source 2, a c...

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Abstract

The invention relates to a vertical measuring system capable of adjusting a zero-plane position, which comprises a double optical wedge mechanism. The double optical wedge mechanism is positioned in the light path of the vertical measuring system and used for changing the offset of light beam in the light path. The double optical wedge mechanism comprises a first wedge and a second wedge which are both arranged along the light path in sequence, wherein the first wedge comprises an incident face and a first inclined plane; the second wedge has the same wedge angle and refractive index as the first wedge and comprises an exit face and a second inclined plane, wherein the exist face is parallel with the incident face, and the second inclined plane and the first inclined plane are opposite to and parallel with each other. When the first wedge and the second wedge move facing to each other along the horizontal direction and the vertical direction, the offset of an incident beam is changed. The invention has the advantages of simple structure, favorable flexibility, fast adjusting speed and high precision.

Description

technical field [0001] The invention relates to a measurement system, and in particular to a vertical measurement system of a lithographic equipment. Background technique [0002] With the development of large-scale and ultra-large-scale integrated circuit manufacturing processes, lithography machines, which are the drivers of this industry's development, are also becoming more and more advanced. Improving the measurement accuracy of the vertical measurement system of the lithography machine is a prerequisite for optimizing the exposure quality. However, while improving the vertical measurement accuracy, the measurement range is continuously reduced. [0003] Due to factors such as thermal drift and assembly errors in the lithography machine, the deviation between the zero plane position of the vertical measurement system and the best focal plane of the projection objective lens is relatively large. For the vertical measurement system, the deviation will inevitably be intro...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20G01B11/00
Inventor 金小兵李志丹
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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