Three-silver low radiation film glass
A low-emissivity film and glass technology, applied in the field of triple-silver low-emissivity film glass, can solve the problems of interfering colors in appearance, failure to achieve comprehensive indicators, and reduced visible light transmittance, and achieve good optical stability and good selection coefficient. , the effect of various colors
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[0033] The film structure of the triple-silver low-emissivity film glass provided by the present invention is: glass substrate / basic dielectric composite layer (10-30nm) / first Ag layer (8-35nm) / first barrier layer (1-10nm) / First interlayer dielectric combination layer (38-90nm) / second Ag layer (8-35nm) / second barrier layer (1-10nm) / second interlayer dielectric combination layer (30-110nm) / third Ag layer (8-35nm) / third barrier layer (1-10nm) / first upper dielectric composite layer (10-35nm) / second upper dielectric composite layer (10-30nm).
[0034] Each dielectric film layer is a metal or non-metal oxide or nitride deposited by vacuum sputtering, such as TiO 2 , ZnSnO x , SnO 2 , ZnO, SiO 2 、 Ta 2 o 5 、BiO 2 、Al 2 o 3 , ZnAl 2 o 4 , Nb 2 o 5 、Si 3 N 4 , AZO, etc.
[0035] In practical applications, the film structure and thickness of the commonly used triple-silver low-emissivity film glass are: glass substrate / base dielectric combination layer (15-17nm) / first A...
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