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Etalon and method for producing the same

A technology of etalons and substrates, applied in the fields of optics and etalons, can solve problems such as difficult fabrication

Inactive Publication Date: 2009-06-24
SHANGHAI BRANCH FUZHOU GAOYI COMM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

when d 1 、d 2 When it is very thin, these two structures are difficult to make in actual production

Method used

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  • Etalon and method for producing the same
  • Etalon and method for producing the same

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Embodiment Construction

[0040] The present invention will be further described in conjunction with the accompanying drawings and specific embodiments.

[0041] The etalon of the present invention comprises:

[0042] The first substrate is coated with a specific wavelength reflection or partial reflection film; an optical medium thin layer is coated on the coating surface of the first substrate, and the thickness of the optical medium coating is determined according to the thickness of the designed etalon; The second substrate is coated with a specific wavelength reflection or partial reflection film, and the coating surface is glued to the optical medium thin layer through optical glue or deepening optical glue.

[0043] If the optical medium thin layer is a complete thin layer, a solid etalon is formed.

[0044] If the optical medium thin layer is a thin layer missing in the central region, a cavity etalon is formed.

[0045] The material of the substrate is K9 glass or other optical materials. T...

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PUM

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Abstract

An etalon and a manufacturing method thereof relate to the optical field, in particular to the field of etalons. Ultra-thin film solid and hollow etalons are manufactured by binding plating with deepening optical cement and optical cement. After an optical medium with a certain thickness is directly plated on a reflecting film or a high reflecting film at the cavity part of the etalon, the solid etalon is formed by the optical cement and the deepening optical cement of another film layer in the cavity of the etalon or after a homogeneous dielectric film is placed in the non-central area of the film surface of the cavity of the etalon by adopting the shading or the photo etching method, the ultra-thin etalon with an air gap at the center is formed by the mutual optical cement and the deepening optical cement again. The invention discloses a novel etalon by adopting the technical proposal. The etalon has a small thickness, can achieve a plurality of um magnitudes, is bonded together by adopting the optical cement method and the deepening optical cement method, and can be manufactured more conveniently. Furthermore, the ultra-thin etalon has larger free spectral range and is suitable for laser mode selection and other aspects.

Description

technical field [0001] The invention relates to the field of optics, in particular to the field of etalons. Background technique [0002] The etalon achieves multi-beam interference by coating metal films or multi-layer dielectric reflective films on both surfaces of the flat plate. Using the principle of multi-beam interference to produce very fine and sharp fringes, the beam of specific wavelength can be selected to pass through the etalon with high transmittance , while other wavelengths are almost completely lost. The production of the etalon requires that the distance between the two plates is constant and strictly parallel. The schematic diagram of its optical path is as follows: figure 1 As shown, a simple analysis shows that the bit of each ray lags behind the previous ray: δ = 2 π λ 0 ΔL = 4 ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/28G02B1/10B32B37/12
Inventor 陈卫民吴砺黄顺宁邱英杨建阳凌吉武
Owner SHANGHAI BRANCH FUZHOU GAOYI COMM CO LTD
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