Coated glass pane
A glass plate, coating technology, applied in the direction of thin material handling, transportation and packaging, etc., can solve the problem of unsatisfactory resistance to mechanical and chemical influences, etc.
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Embodiment 1
[0102] Coatings comprising the several layers indicated in Table 1 below were deposited onto glass plates in a sputtering apparatus with several separate sputtering chambers in which the following targets or pairs of targets were placed:
[0103] (1) The first target pair, including:
[0104] (a) metal-doped silicon target (in SISPA TM 10 commercially available from W.C. Heraeus), which contains about 10 wt.% of Al as the main dopant, and
[0105] (b) Ceramic aluminum-doped zinc oxide target (ZAO TM Commercially available from W.C. Heraeus), which contains about 2 wt.% Al 2 o 3 ;
[0106] (2) Zinc target;
[0107] (3) silver target;
[0108] (4) A second target pair, comprising
[0109] (a) Ceramic TiO x Target (xx CLATO TM Commercially available from W.C. Heraeus)
[0110] (b) Ceramic ZnO:Al target (ZAO TM Commercially available from W.C. Heraeus), which contains about 2 wt.% Al 2 o 3 .
[0111] The sputtering device allows moving the glass plate at a controlled...
Embodiment 2
[0121] A coating with essentially the same layer sequence and thickness as in Example 1 was deposited. However, the difference from Example 1 is that the compound layer is deposited by moving the substrate about 4 times faster under the Al-doped Si(Si:Al) / Al-doped ZnO(ZnO:Al) target pair , and by correspondingly employing 8-16-8 moves to deposit 3 compound layers having substantially the same total thickness as in Example 1. Table 3 summarizes the deposition conditions:
[0122] table 3
[0123] Attached picture
mark
target composition
the power
[kW] the power
Types of Ar
[sccm] N 2
[sccm] o 2
[sccm] speed
[mm / min] move
frequency
15
Si:Al /
ZnO:Al
10 / 2
Pulse DC
200
150
-
3284
8
16 Zn 14 DC 140 - 450 5900 1 13 Ag 1.5 DC 250 - - 1875 1
17
TiO x /
ZnO:Al
3 / 3
Pulse DC
...
Embodiment 4-9 and comparative example 10
[0139] In another series of experiments, the Si:Zn atomic ratio in the compound layer of a coating with a layer sequence similar to that of Example 1 was varied, with the following differences in addition:
[0140] - set the thicknesses of the compound layers 15, 39 and 24 in the coating of the invention and the (aluminum-doped) silicon nitride layer in the comparative coating of Comparative Example 10 to 40, 80 and 40 nm, respectively (as in Example 1 and 35, 70 and 35 nm in Comparative Example 3), a 2-4-2 movement was achieved under the target at a slightly reduced rate.
[0141] - The power ratio of the Si:Al / ZnO:Al target used to deposit the compound layers 15, 39 and 24 of a further embodiment of the invention was varied between 15:2 (Example 4) and 15:8 (Example 9) , thus achieving in these layers the Si:Zn atomic ratio shown in the second column of Table 5 below (from XPS analysis) (compared to about 2:1 in Examples 1 and 2).
[0142] All coated glass panels were heat ...
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