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Silicone hydride waste gas processing equipment

A technology for waste gas treatment and waste gas, which is applied to the separation of dispersed particles, chemical instruments and methods, separation methods, etc., can solve the problems that are not suitable for low-cost and large-scale production, and achieve the effect of low price, low production and easy operation

Inactive Publication Date: 2008-08-20
BEIJING XINGZHE MULTIMEDIA TECH
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  • Abstract
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Problems solved by technology

Traditional silane exhaust gas treatment equipment is particularly unsuitable for low-cost and high-volume production of silicon-based devices, including large-area silicon-based thin-film materials for optoelectronic devices

Method used

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  • Silicone hydride waste gas processing equipment

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Embodiment Construction

[0020] As shown in the drawings, the exhaust gas treatment system provided by the present invention is actually the simplest large-capacity thermal CVD system, consisting of the following main parts: a sealed metal furnace wall 60, preferably tubular, made of stainless steel or other strong made of heat-resistant metal or alloy; an internal steel pipe 68, which must be high temperature resistant and chemically stable, with a length of not less than 0.5 meters and a diameter of not less than 10 centimeters, placed in the center of the furnace wall; gas reactant 66 , its porous structure allows gas to pass through. At the same time, the reactant must remain stable at a high temperature of 700°C, and the reactant is compactly arranged in the inner steel pipe; the heating element 64, which can be made of an electric heater or a fossil fuel device, can keep the temperature of the gas reactant at Above 500°C, the heating element is wrapped around the inner steel pipe; the heat insul...

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Abstract

The invention discloses a novel silane waste gas processing equipment and method, which is suitable in large-scale semiconductor device production process. The processing system comprises a high temperature stainless steel tube which is filled with gravel. The silane waste gas exhausted from the film processing equipment is introduced into the high temperature stainless steel tube; then the silane is pyrolyzed and the decomposition products are deposited on the gravel; the gravel need periodic replacement. The silane waste gas processing equipment has the advantages of inimitable low cost, efficient and reliable treatment for waste gas the generated in vacuum deposition system.

Description

technical field [0001] The present invention describes equipment for the treatment of waste gases from semiconductor production processes, and in particular to a treatment of silane (SiH 4 ) waste gas treatment equipment and methods. Background technique [0002] Vacuum processing equipment is widely used in large-scale manufacturing of silicon-based semiconductor device processes, such as integrated circuits and solar cells, including large-area photovoltaic cell components based on silicon thin films. CVD (Chemical Vapor Deposition) and Chemical Vapor Etching are currently more popular technical means for making the products referred to. For example, polysilicon or silicon dioxide layers in integrated circuits can be 4 Gas or other similar gases are deposited by CVD. In another example, silanes are used in plasma-enhanced chemical vapor deposition (PECVD) processes to produce thin-film solar cells based on hydrogenated amorphous and nanocrystalline silicon. After the C...

Claims

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Application Information

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IPC IPC(8): B01D53/46B01D53/72B01D53/74F23G7/06
Inventor 李沅民马昕
Owner BEIJING XINGZHE MULTIMEDIA TECH
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