Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Sun blocking stack

A layered structure and base layer technology, applied in thin material handling, transportation and packaging, etc., can solve problems such as difficult neutralization and color tone

Inactive Publication Date: 2008-07-09
AGC GLASS EUROPE SA
View PDF3 Cites 29 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Another disadvantage of the solution proposed by this document WO'065 is that it is difficult to neutralize the tint provided by the absorbing layer inserted in the middle of the dielectric

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Sun blocking stack

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0084] A 2 m x 1 m x 6 mm thick sheet of ordinary transparent soda-lime float glass was loaded in a magnetron type cathode sputtering apparatus operated under reduced pressure (approximately 0.3 Pa) by means of a magnetic field. On the glass sheet is deposited a multi-layer anti-sunlight laminated structure comprising in order:

[0085] a) A first dielectric coating consisting of two oxide layers deposited from zinc-tin alloy cathodes of different compositions in a reactive atmosphere formed by a mixture of argon and oxygen. A first zinc-tin mixed oxide having a thickness of approximately 30 nanometers was formed from a cathode of a zinc-tin alloy having 52 wt% zinc and 48 wt% tin to form zinc stannate Zn 2 SnO 4 spinel structure. A second zinc-tin mixed oxide ZnSnO with a thickness of about 10 nanometers x Deposited from a zinc-tin alloy target with 90% by weight zinc and 10% by weight tin.

[0086] b) a first infrared reflective functional layer consisting of approximate...

Embodiment 2

[0119] Example 2 was carried out in the same manner as Example 1 but with a different stack structure. In this example, the following sequence is used:

[0120] a) A first dielectric coating consisting of two oxide layers deposited from zinc-tin alloy cathodes of different compositions in a reactive atmosphere formed by a mixture of argon and oxygen. A first zinc-tin mixed oxide with a thickness of approximately 24 nanometers was formed from a cathode of a zinc-tin alloy having 52 wt% zinc and 48 wt% tin to form zinc stannate Zn 2 SnO 4 spinel structure. A second zinc-tin mixed oxide ZnSnO with a thickness of about 8 nanometers x Deposited from a zinc-tin alloy target with 90% by weight zinc and 10% by weight tin.

[0121] b) a first infrared reflective functional layer consisting of about 9 nanometers of silver from an almost pure silver target in a neutral argon atmosphere,

[0122] c) A first sacrificial metal layer consisting of a layer of Ti deposited from titanium p...

Embodiment 3 to 15

[0152] Unless otherwise specified, the following Examples 3 to 15 were carried out in a similar manner to the above Example 1 but with different structures. The corresponding stack structures are given in Table 1 below, and the abbreviations used are explained below:

[0153] • D1 = first dielectric coating, consisting of two or three oxide or nitride or optionally oxynitride layers. The nitride layer is deposited from a metal target in a reactive mixture of nitrogen and argon. This applies to the other dielectrics of the stack (if this is the case). The Si used in these examples 3 N 4 Layers can be slightly oxidized in the form of SiOxNy. It should be noted that Si 3 N 4 and ZnO layers can be doped with aluminum in a known manner.

[0154] • D2 = intermediate dielectric coating, if present in an embodiment, consisting of an oxide or nitride or optionally oxynitride layer like D1.

[0155] • D3 = outer dielectric coating, consisting of one or two oxide or nitride or opti...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention relates to a multilayer sun blocking stack formed on a sheet of vitreous material, comprising at least one functional layer made from a material that reflects infrared radiation and comprising at least two dielectric coatings, each functional layer being surrounded by the dielectric coatings. Said stack, when it is placed on an ordinary clear float sodiocalcic glass sheet having a width of 6 mm, has a solar factor FS of less than 45 % and a light transmission TL of less than 70 %. According to the invention, the stack comprises an essentially metallic absorbent material based on the following elements: Pd, Pt, Au, Ir, Rh, Ru, Os, Co, Ni, Cu, Cr, La, Ce, Pr, Nd, W, Si, Zn, Mo, Mn, Ti, V, Nb, Hf, Ta and alloys thereof, placed in immediate proximity to the functional layer or included in this functional layer. The invention is particularly advantageous for forming selective glazings exhibiting a high level of sun blocking and having a nice aesthetic appearance and, in particular, glazings having been subjected to a high-temperature tempering and / or bending heat treatment.

Description

technical field [0001] The present invention relates to a multilayer solar-resistant empilage formed on a sheet of vitreous material, to a glass sheet with said laminate, and to a multilayer vitrage comprising such a glass sheet. [0002] The solar protection laminate according to the invention comprises at least one functional layer based on a material reflecting infrared radiation and at least two dielectric coatings, one of which is a first dielectric coating deposited directly on a sheet of vitreous material, Further coatings are located on the outside relative to the one or more functional layers, each functional layer being surrounded by a dielectric coating. These various layers are deposited by means of magnetic field-assisted reduced-pressure cathode sputtering, for example in known magnetron-type devices. Background technique [0003] These solar-resistant laminates are used to form solar-resistant glazing in order to reduce the risk of excessive heating caused by...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C03C17/36
CPCC03C17/36C03C17/3618C03C17/3626C03C17/3639C03C17/3644C03C17/3652C03C17/366C03C17/3681Y10T428/265Y10T428/266
Inventor P·罗奎尼A·埃克
Owner AGC GLASS EUROPE SA
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com