Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Radiation-sensitive resin composition, protrusion and spacer formed of the same, method of forming the radiation-sensitive resin composition, and liquid crystal display element

A technology for liquid crystal display elements and separators, which is applied in electrical components, static indicators, photosensitive material processing, etc., and can solve the problems of time-consuming, reduced production capacity, and low exposure.

Active Publication Date: 2011-09-07
JSR CORPORATIOON
View PDF8 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the step exposure method exposes one substrate several times, and it takes time to align the position and move the step by step for each exposure. Compared with the overall exposure method, it is considered to be a problem that lowers productivity.
[0022] In addition, in the overall exposure mode, it can be 3,000J / m 2 However, in stepwise exposure, the exposure amount must be lower each time. It is difficult for the existing radiation-sensitive resin composition used in the formation of spacers to achieve 1,200J / m 2 Formation of sufficient spacer shape and film thickness at lower exposure levels

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Radiation-sensitive resin composition, protrusion and spacer formed of the same, method of forming the radiation-sensitive resin composition, and liquid crystal display element
  • Radiation-sensitive resin composition, protrusion and spacer formed of the same, method of forming the radiation-sensitive resin composition, and liquid crystal display element
  • Radiation-sensitive resin composition, protrusion and spacer formed of the same, method of forming the radiation-sensitive resin composition, and liquid crystal display element

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0241] Hereinafter, the embodiments of the present invention will be described in more detail with examples. Here, parts and% are weight basis.

Synthetic example 1

[0243] In a flask equipped with a cooling tube and a stirrer, add 5 parts of 2,2'-azobisisobutyronitrile and 250 parts of diethylene glycol methyl ethyl ether, and then add 35 parts of 2-methacryloxyethyl Succinic acid, 25 parts of n-butyl methacrylate, 35 parts of benzyl methacrylate, after nitrogen replacement, add 5 parts by weight of 1,3-butadiene, stir slowly and raise the temperature of the solution to 90°C The temperature was maintained for 5 hours for polymerization to obtain a [A] copolymer solution with a solid content concentration of 28.0%. Let this be [A-1] polymer.

[0244] The obtained polymer [A-1] measured Mw using GPC (Gel Permeation Chromatography) HLC-8020 (trade name, manufactured by Tosoh Co., Ltd.) and found to be 12,000.

Synthetic example 2

[0246] In a flask equipped with a cooling tube and a stirrer, 5 parts by weight of 2,2'-azobis (2,4-dimethylvaleronitrile) and 200 parts by weight of diethylene glycol methyl ethyl ether were added, and then 18 Parts by weight of methacrylic acid, 40 parts by weight of glycidyl methacrylate, 5 parts by weight of styrene, 32 parts by weight of tricyclic methacrylic acid [5.2.1.0 2，6 ] After replacing the dec-8-yl ester with nitrogen, add 5 parts by weight of 1,3-butadiene, stir slowly and raise the temperature of the solution to 70°C, keep the temperature for 5 hours for polymerization to obtain a copolymer [ A-2] solution.

[0247] The solid content concentration of this solution was 33.0% by weight, and the Mw of the copolymer [A-2] was 11,000.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The present invention provides a radiation-sensitive resin composition which is suitably used for simultaneously forming protrusions and spacers of a vertical alignment liquid crystal display element. The radiation-sensitive resin composition for simultaneously forming the protrusions and the spacers for the vertical alignment liquid crystal display element is characterized to contain: a copolymer [A], obtained by copolymerizing an unsaturated carboxylic acid and / or an unsaturated carboxylic acid anhydride (a1), and an unsaturated compound (a2) other than the component (a1), a polymerizable unsaturated compound [B], and a radiation-sensitive polymerization initiator [C] having a specified structure, represented by ethanone, 1-[9-ethyl-6-(2-methyl-4-tetrahydrofuranylmethoxy benzoyl)-9.H.-carbazole-3-yl]-, 1-(O-acetyloxime).

Description

Technical field [0001] The present invention relates to a radiation-sensitive resin composition for simultaneously forming protrusions and spacers of a vertical liquid crystal display element, protrusions and spacers formed from the composition, and liquid crystal displays comprising the protrusions and spacers element. Background technique [0002] Liquid crystal display panels are currently widely used in flat panel displays. In particular, with the promotion of OA equipment such as personal computers and word processors, and liquid crystal televisions, the requirements for the display quality of TFT (thin film transistor) liquid crystal display panels (TFT-LCD) have become more and more stringent. [0003] Among TFT-LCDs, TN (Twisted Nematic) LCDs are currently the most used. The LCD is manufactured by the following method: A polarizing film with a 90-degree difference in orientation direction is arranged on the outer side of two transparent electrodes, and an alignment film i...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/26G03F7/20G03F7/004G03F7/16G02F1/133
Inventor 一户大吾浜口仁梶田彻
Owner JSR CORPORATIOON
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com