All-refraction immersion type projection and optical system, device and its uses

Abstract

The invention provides a total refraction immersed projection optical system and device and the application thereof, for imaging pattern in object plane of the optical system into image plane of the optical system; the optical system comprises six lens sets in the light axis direction, where the first, third, fifth and sixth have positive focal power and the second and fourth lens sets have negative focal power; aperture grating is located between the fifth and sixth lens sets; high refractivity liquid medium is filled between the image plane and lens closest to the image plane; the optical surface of each lens is spherical or planar. And the invention implements large numeric aperture, high resolution and better imaging quality; enlarges object-side working distance but does not introduce nonsphere, reduces difficulty in optical machining, detection and mounting and check, and besides, effectively reduces the making cost.

Description

technical field [0001] The invention relates to a projection optical system, in particular to a total refraction projection optical system, device and application of a liquid immersion photolithography device in the semiconductor field. Background technique [0002] Lithographic projection objectives have been used for decades in the manufacture of semiconductor devices and other precision structural components. It is mainly used in the front-end photolithography process of semiconductors, and the pattern on the mask is projected and imaged on the substrate coated with photosensitive substances through the projection optical system. With the improvement of the integration level of semiconductor devices, the requirements for the resolution of the projection optical system continue to increase. Generally, there are three main ways to improve the resolution of the projection optical system. The first is to increase the image square numerical aperture (NA) of the projection opt...

AI Technical Summary

Problems solved by technology

However, the patent has the following problems: the number of lenses and aspheric surfaces is large, the field of view of the image side is small, and the working distance of the object side is small; Structural design brings great difficulties; the working distance of the image square is either too large or too small, which increases the difficulty of controlling the liquid medium

Regarding the imaging quality, the patent only provides the ray aberration curve, and does not provide the specific data of the wave aberration, and the number of aspheric surfaces and lenses is relatively large, the field of view of the image square, the working distance of the object space, and the numerical aperture are all relatively small

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