Process for forming cobalt and cobalt silicide materials in tungsten contact applications

Abstract

Embodiments of the invention described herein generally provide methods for forming cobalt silicide layers and metallic cobalt layers by using various deposition processes and annealing processes. In one embodiment, a method for forming a metallic silicide containing material on a substrate is provided which includes forming a metallic silicide material over a silicon-containing surface during a vapor deposition process by sequentially depositing a plurality of metallic silicide layers and silyl layers on the substrate, depositing a metallic capping layer over the metallic silicide material, heating the substrate during an annealing process, and depositing a metallic contact material over the barrier material. In one example, the metallic silicide layers and the metallic capping layer both contain cobalt. The cobalt silicide material may contain a silicon / cobalt atomic ratio of about 1.9 or greater, such as greater than about 2.0, or about 2.2 or greater.

Description

CROSS-REFERENCE TO RELATED APPLICATIONS[0001]This application is a continuation-in-part of U.S. Ser. No. 11 / 733,929 (APPM / 005547.P2), filed Apr. 11, 2007, which claims benefit of U.S. Ser. No. 60 / 791,366 (APPM / 010948L), filed Apr. 11, 2006, and U.S. Ser. No. 60 / 863,939 (APPM / 010948L.02), filed Nov. 1, 2006, and which is also a continuation-in-part of U.S. Ser. No. 11 / 456,073 (APPM / 005547.C2), filed Jul. 6, 2006, which is a continuation of U.S. Ser. No. 10 / 845,970 (APPM / 005547.C1), filed May 14, 2004, and now abandoned, which is a continuation of U.S. Ser. No. 10 / 044,412 (APPM / 005547.P1), filed Jan. 9, 2002, and issued as U.S. Pat. No. 6,740,585, which is a continuation-in part of U.S. Ser. No. 09 / 916,234 (APPM / 005547), filed Jul. 25, 2001, and now abandoned, which are all herein incorporated by reference in their entirety.BACKGROUND OF THE INVENTION[0002]1. Field of the Invention[0003]Embodiments of the invention relate to the fabrication of semiconductor and other electronic device...

AI Technical Summary

Benefits of technology

[0029]In some examples, the reagent may contain a reducing agent, such as hydrogen, silane, disilane, diborane, ammonia, phosphine, derivatives thereof, plasmas thereof, or combinations thereof. The substrate may be exposed to a plasma during the treatment process. In other examples the apertures may be filled with a copper bulk layer by depositing copper therein and over the copper seed layer during a bottom-up deposition process, such as a PVD process, an ECP process, or an electroless deposition process.

[0030]In another embodiment, a

Problems solved by technology

However, it has been difficult to integrate cobalt silicide processes into conventional manufacturing equipment.

Transfer between chambers may expose the substrate to contamination and potential oxidation of silicon or cobalt deposited on the substrate surface.

Oxide formation on the surface of the substrate can result in increasing the resistance of silicide layers as well as reducing the reliability of the overall circuit.

For example, oxidation of the deposited cobalt material may result in cobalt agglomeration and irregular growth of the cobalt silicide layer.

The agglomeration and irregular growth of the cobalt silicide layer may result in device malformation, such as source and drain electrodes having different thicknesses and surface areas.

Additionally, excess cobalt silicide growth on substrate surface may form conductive paths between devices, which may result in short circuits and device failure.

However, the addition of titanium and titanium nitride deposition and removal processes increases the number of processing steps required for silicide formation, thereby reducing process efficiency, increasing processing complexity, and reducing substrate throughput.

However, deposition of titanium over silicon surfaces presents the problem of titanium silicide formation.

Titanium silicide has been observed to agglomerate, which detrimentally affects subsequently deposited materials.

Also, titanium silicide exhibits a radical increase in sheet resistance as feature sizes decrease below 0.17 μm, which detrimentally affects the conductance of the feature being formed.

Further, titanium silicide has an insufficient thermal stability during processing of the substrate at temperatures of about 400° C. or higher, which can result in interlayer diffusion and detrimentally affect device performance.

This results in difficult integration of PVD and CVD processes in the same system.

The increase in the number of systems results in increased production costs, increased production times, and exposes the processed substrate to contamination when transferred between systems.

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