X-ray mask and quartz ring ultraviolet solidifying apparatus and method for using

Abstract

It is a X-ray mask and quartz ring ultraviolet solidifying apparatus, which comprises the following: a X-ray mask workbench which comprises X-azimuth handwheel, Y-azimuth handwheel and rotation handwheel around Z axis; a vacuum clamping device located under the workbench to vacuum adsorb the X-ray mask through tube channel, wherein, the X-ray mask workbench is mainly used to locate the X-ray mask to be ultraviolet solidified; a quartz ring workbench under the X-ray mask workbench to prevent the deformation of the X-ray mask workbench; a ultraviolet light source under the quartz ring workbench; a parallel lens located between the quartz ring workbench and ultraviolet light source; a microscope under the X-ray mask workbench to observe the calibration status; the above X-ray mask workbench, quartz ring workbench, ultraviolet source ,parallel lens and microscopes.

Description

technical field [0001] The invention relates to the field of microfabrication, in particular to an ultraviolet curing device for an X-ray mask and a quartz ring and a usage method. Background technique [0002] The application of X-ray lithography to the manufacture of millimeter-wave circuits has many advantages compared to other lithography methods. For example, it can meet the processing technology of 0.05-0.25 microns required for the manufacture of millimeter-wave circuits; a point source of X-ray light The engraving machine efficiency exceeds 7 electron beam direct writing machines, and the T-shaped grid pattern produced by X-ray lithography technology is very easy to peel off, etc. The difficulty of X-ray lithography technology is the manufacture of X-ray masks. During the manufacture of X-ray masks, the X-ray mask substrate must be bonded to the quartz ring. The bonding process can be described as follows: Fixture on the ray mask and borosilicate glass ring→apply ex...

AI Technical Summary

Problems solved by technology

The difficulty of X-ray lithography technology is the manufacture of X-ray masks. During the manufacture of X-ray masks, the X-ray mask substrate must be bonded to the quartz ring. The bonding process can be described as follows: Fixture on the ray mask and borosilicate glass ring→apply external pressure on the fixture→heat up→anodize and bond the borosilicate glass ring→cool down→remove the external pressure→remove the fixture. This process is very complicated, and there are many factors that affect the bonding quality. And it will affect the positioning accuracy of the X-ray mask to a certain extent

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