Formation method of semiconductor structure
A semiconductor and isolation structure technology, applied in the field of semiconductor structure formation, can solve the problems such as the performance and reliability of the semiconductor structure need to be improved, and achieve the effects of less residue, smooth sidewall surface, and improved performance and reliability
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[0024] As mentioned in the background, the performance and reliability of existing semiconductor structures still need to be improved. The reasons why the performance and reliability of the semiconductor structure still need to be improved will be described in detail below with reference to the accompanying drawings.
[0025] Figure 1 to Figure 5 It is a schematic structural diagram of each step of a method for forming a semiconductor structure.
[0026] Please refer to figure 1 and figure 2 , figure 2 Yes figure 1 Schematic diagram of the cross-sectional structure along the direction A1-A2, figure 1 Yes figure 2 A schematic top view of the structure along the direction B in the middle, a substrate 100 is provided, and the substrate 100 has a plurality of fins 101 separated from each other; a first dielectric layer 110 is formed on the surface of the substrate 100, and the first dielectric layer 110 Covering part of the sidewall surface of the fin 101; forming a n...
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