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1030nm sine type dielectric grating and manufacturing method thereof

A manufacturing method and a grating technology, applied in the field of optical components, can solve problems such as increasing the difficulty of grating processing, and achieve the effects of high etching process redundancy, easy manufacturing, and large redundancy.

Pending Publication Date: 2022-05-10
福建睿创光电科技有限公司
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The grating needs to control the duty cycle and grating groove depth, and it needs to etch multi-layer film layers, which increases the processing difficulty of the grating

Method used

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  • 1030nm sine type dielectric grating and manufacturing method thereof
  • 1030nm sine type dielectric grating and manufacturing method thereof
  • 1030nm sine type dielectric grating and manufacturing method thereof

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Embodiment Construction

[0033] The present invention will be described in detail below in conjunction with the accompanying drawings and specific embodiments.

[0034] first part

[0035] refer to Figure 4-5 , a 1030nm sinusoidal dielectric grating, comprising a top grating 1, a middle multilayer dielectric layer 2 and a substrate 3; the material of the top grating 1 is a high refractive index film material, and the middle multilayer dielectric layer 2 includes several alternately stacked The high refractive index material medium film layer 201 and the low refractive index material medium film layer 202, the material of the substrate 3 is a low refractive index material; the groove shape of the top grating 1 is sinusoidal. Compared with the existing all-dielectric grating, the grating contains only one film layer, and there is no need to precisely control the grating groove depth, duty cycle and groove shape during fabrication, which reduces the difficulty of grating fabrication.

[0036] Further,...

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Abstract

The invention relates to a 1030nm sine type dielectric grating and a manufacturing method thereof. The grating comprises a top grating, a middle multilayer dielectric layer and a substrate, the top grating is made of a high-refractive-index film material, the middle multi-layer dielectric layer comprises a plurality of high-refractive-index material dielectric film layers and low-refractive-index material dielectric film layers which are alternately overlapped, and the substrate is made of a low-refractive-index material; the groove type of the top grating is a sine type. According to the manufacturing method, a high-refractive-index film layer is arranged above a middle multi-layer dielectric layer, the high-refractive-index film layer is made of a high-refractive-index film material, and the thickness of the high-refractive-index film layer is 0.5-0.6 mu m; arranging a layer of photoresist on the high refractive index film layer; and the photoresist is made into a mask through a holographic interference system, and then the mask is etched into a top grating. According to the grating, the TE polarization state and the TM polarization state can have extremely high diffraction efficiency under Littrow incidence within the wave band of 1020-1040 nm, only one film layer needs to be etched during manufacturing, and the etching process is high in redundancy.

Description

technical field [0001] The invention relates to a 1030nm sinusoidal dielectric grating and a manufacturing method thereof, belonging to the technical field of optical elements. Background technique [0002] In the field of high-power lasers, pulse compression gratings are often used as core optical components. Metal gratings, metal dielectric film gratings, and all-dielectric gratings can achieve high diffraction efficiency. characteristics, making it easy to be damaged by laser light under high power, and metal gratings can only have high diffraction efficiency under TM polarization; all-dielectric gratings have the advantages of high diffraction efficiency and high damage threshold, and the diffraction polarization is independent, so all Dielectric gratings are the first choice for pulse compression gratings. However, the groove shape of conventional all-dielectric gratings is rectangular or trapezoidal, and the gratings contain two or more layers. Usually, it is necessary...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/18
CPCG02B5/1809G02B5/1857
Inventor 方志辉游静李广伟
Owner 福建睿创光电科技有限公司
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