Quartz tube cleaning and drying device

A drying device and quartz tube technology, applied in the direction of drying gas arrangement, drying, dryer, etc., can solve the problems of scratches on the outer wall of the quartz tube, affecting the stability of the quartz tube, and the weight of the quartz tube. Unstable rotation posture, the effect of increasing the need for cleaning and drying

Inactive Publication Date: 2022-01-21
ZHICHENG SEMICON EQUIP TECH (KUNSHAN) CO LTD
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  • Abstract
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  • Claims
  • Application Information

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Problems solved by technology

Therefore, when the tube nozzle at the top sprays deionized water (DIW) or cleaning agent into the opening of the quartz tube, the weight of the entire quartz tube will be huge, which will seriously affect the stability of the quartz tube when it is driven by the turntable and rotates. Sexuality and increase energy consumption, and there is a serious waste of deionized water
In addition, objectively, this cleaning device has a poor cleaning effect on the inner wall of the quartz tube due to the liquid stored in the quartz tube.
Secondly, because the prior art needs to be supported by the workpiece support on the turntable, the outer wall of the quartz tube in contact with the workpiece support is shielded by the workpiece support, resulting in the defect that the outer wall of the quartz tube cannot be effectively cleaned. Moreover, the turntable needs to withstand the huge pressure exerted by the quartz tube and the liquid stored in the quartz tube, which will easily cause the turntable to malfunction and cause damage to the turntable; finally, the applicant also pointed out that this prior art can only be used for one kind of The quartz tube with a specific diameter is cleaned, and the outer wall of the quartz tube will rub against the workpiece holder during the rotation process, which will cause scratches on the outer wall of the quartz tube during the cleaning process, and cannot meet the cleaning needs of quartz tubes with different diameters

Method used

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  • Quartz tube cleaning and drying device

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Embodiment Construction

[0040] It should be noted that when an element is considered to be "connected" to another element, it may be directly connected to the other element or there may be intervening elements at the same time. Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the technical field of the invention. The terms used herein in the description of the present invention are for the purpose of describing specific embodiments only, and are not intended to limit the present invention.

[0041] ginseng Figure 1 to Figure 15 A specific embodiment of a quartz tube cleaning and drying device 100 of the present invention is shown. The quartz tube cleaning and drying device 100 disclosed in this embodiment is used to clean and dry the quartz tube in a vertical posture, and is especially suitable for preparing wafers with a size of 8 inches and above in chemical vapor deposition (CVD) ), physical vapor d...

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Abstract

The invention provides a quartz tube cleaning and drying device. The quartz tube cleaning and drying device comprises a cleaning cover, a base, a bearing table and a first driving device, wherein the bottom of the cleaning cover is provided with an opening; the base is movably assembled on the cleaning cover in an inserted mode in the vertical direction; the bearing table is arranged in the base and hoops a quartz tube; a cleaning cap and a second driving device for driving the cleaning cap to do lifting motion are arranged in the top of the cleaning cover; the cleaning cap shields the arc-shaped closed end of the quartz tube and is separated from the arc-shaped closed end of the quartz tube; a plurality of first nozzles which are laterally and continuously arranged at intervals are arranged on the inner wall surface of the cleaning cap; a rotary sealing device is embedded in the base, and an inner spraying pipe is vertically arranged on the bearing table and continuously penetrates through the bearing table and the rotary sealing device in the vertical direction; and the first driving device drives the bearing table to rotate, and the inner spraying pipe is kept static in the rotating process of the bearing table. According to the quartz tube cleaning and drying device, the problems that the quartz tube is likely to overturn and unstable in rotating posture in the rotary cleaning process are effectively solved, and the cleaning and drying requirements of quartz tubes with different diameters are met.

Description

technical field [0001] The invention relates to the technical field of semiconductor equipment consumable cleaning equipment, in particular to a quartz tube cleaning and drying device. Background technique [0002] Quartz tube is a semiconductor equipment consumable commonly used in semiconductor device manufacturing equipment (such as chemical vapor deposition (CVD), physical vapor deposition (PVD), diffusion equipment (Diff) or film formation equipment (T / F), etc.). After the quartz tube is used in the aforementioned semiconductor equipment for a period of time, a large amount of dirt, metal impurities or solid particles will remain on the inner wall surface. However, the quartz tube is expensive, so it needs to be reused after being thoroughly cleaned to reduce the manufacturing cost of semiconductor devices . [0003] After searching, the applicant found that the Chinese invention patent with publication number CN101181711A discloses an automatic vertical quartz tube cl...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B08B9/023B08B9/032F26B21/00F26B21/14
CPCB08B9/023B08B9/032F26B21/14F26B21/004
Inventor 华斌刘国强宗君颖
Owner ZHICHENG SEMICON EQUIP TECH (KUNSHAN) CO LTD
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