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Surface cleanliness testing device and method

A surface cleaning and testing device technology, applied in the direction of measuring devices, surface tension analysis, surface/boundary effects, etc., can solve the problems of high misjudgment rate, complex structure, inconvenient operation, etc., to achieve improved accuracy and reliability, high The effect of promoting value

Inactive Publication Date: 2021-12-17
上海梭伦信息科技有限公司
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0027] The technical problem to be solved by the present invention is to provide a surface cleanliness testing device and testing method to solve the problems of high misjudgment rate in current methods such as single contact angle characterization method, UV spectroscopy method, surface free energy characterization method, circular axis symmetry method, etc. Low success rate, complex structure, inconvenient operation, etc., to improve the success rate and reliability of surface cleanliness measurement, used in precision processing industries, especially the measurement of surface cleanliness in semiconductor, wafer, PCB, liquid crystal and other industries , solve practical application problems, improve product yield,

Method used

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  • Surface cleanliness testing device and method
  • Surface cleanliness testing device and method

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Embodiment 1

[0071] Such as Figure 1-7As shown, a surface cleanliness testing device includes a background light source 1, a codirectional light source 2, a bracket 3, a coaxial ring light source 4, a prism 5, a prism fixing bracket 6, a droplet 7, a sample to be tested 8 and an imaging system 9 , the prism 5 is fixed on the prism fixing bracket 6 through the top screw fixing screw, the prism fixing bracket 6 is connected with the bottom of the bracket 3 through the fixing screw, the coaxial ring light source 4 is fixed on the bracket 3 through the fixing screw, and is located on the prism 5 Above, the prism 5, the prism fixing bracket 6, the bracket 3 and the coaxial ring light source 4 are combined into a top-view prism assembly, the background light source 1 and the imaging system 9 are respectively located on both sides of the top-view prism assembly, and the same direction light source 2 Located on the top of the top-viewing prism assembly, the tested sample 8 is provided with a drop...

Embodiment 2

[0093] The optical path structure proposed by the surface cleanliness test device in this embodiment, the test method proposed by the surface cleanliness test device are the same as the first embodiment, and the surface cleanliness test device is roughly the same as the embodiment, the only difference is that this embodiment The annular coaxial light source 4 in the example is a visible light spectrum light source.

[0094] The invention realizes UV top view imaging, coaxial top view and background light side view in the same image by simultaneously providing background light source, coaxial light source, coaxial ring light source and other light source combinations, and through a 90-degree prism structure. The three conditions are imaged in the same image, thereby effectively solving the purpose of the cleanliness test under the influence of chemical diversity and surface structure. At the same time, combined with the optimized cleanliness test process provided by the utility ...

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Abstract

The invention discloses a surface cleanliness testing device and method, and belongs to the technical field of high-precision machining of semiconductors, wafers, OLEDs and the like. The device comprises a background light source, a homonymous light source, a bracket, a coaxial annular light source, a prism, a prism fixing bracket, a liquid drop, a tested sample and an imaging system, wherein the prism is fixed on the prism fixing bracket through a jackscrew fixing screw. Through imaging in the same image from multiple view angles such as the top view and the side view, effective combined measurement of UV analysis, infrared analysis, surface structure analysis and 3D contact angle analysis is realized. The device has great improvement in evaluating physical and chemical properties of solid materials, especially solving misjudgment of surface cleanliness caused by objective surface roughness, chemical diversity and surface structure and improving the precision and the reliability of the surface cleanliness test, has a very high effect in the industries of semiconductors, wafers, silicon wafers, new material research, biomimetic materials and the like, and has a very high popularization value.

Description

technical field [0001] The invention relates to a surface cleanliness test device and a test method, which belong to the technical field of high-precision processing fields such as semiconductors, wafers, and OLEDs. Background technique [0002] Surface cleanliness evaluation is an important tool for material evaluation, especially in high-precision industries such as semiconductors, wafers, and LCD screens. At present, relatively mature evaluation methods of surface cleanliness include UV spectroscopy and surface free energy (contact angle) method. The judgment of cleanliness by UV spectroscopy can only be qualitative, not quantitative. At the same time, for applications in the semiconductor industry, UV spectroscopy cannot measure surface cleanliness. [0003] The technical route of the method for other surface cleanliness is different from this patent. Patent CN201510730678.X "A Method for Testing the Surface Cleanliness of Mechanical Parts" proposes a method for testi...

Claims

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Application Information

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IPC IPC(8): G01N13/02G01N21/94
CPCG01N13/02G01N21/94G01N2013/0208
Inventor 施语辰
Owner 上海梭伦信息科技有限公司
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