Impurity removal process and impurity removal device for HCl for industrial production of chloromethane

Abstract

The invention relates to the technical field of gas impurity removal, and in particular, relates to an impurity removal process and an impurity removal device of HCl for industrial production of chloromethane. The impurity removal process comprises the steps: firstly, heating HCl gas generated by hydrolysis of an organic silicon monomer to 600 DEG C or above at a high temperature, then carrying out gas-solid separation, and finally cooling for producing chloromethane; and the impurity removal device comprises a waste heat utilization device, a three-stage cyclone separator, a temperature regulator and a methanol vaporizer which are connected in sequence, wherein the three-stage cyclone separator is formed by connecting three single-cylinder cyclones in series. The impurity content of the HCl gas treated by the impurity removal process is low, the problem of frequent blockage and shutdown of a chloromethane synthesis device is thoroughly eliminated, meanwhile, comprehensive utilization of heat is realized, and the purposes of energy conservation and consumption reduction are achieved. The invention further provides the impurity removal device, operation is easy, cleaning is convenient, working efficiency is high, and damage is not prone to occurring.

Description

technical field [0001] The invention relates to the technical field of gas impurity removal, in particular to an impurity removal process and an impurity removal device for HCl used in the industrial production of methyl chloride. Background technique [0002] In the organic silicon industry chain, the hydrolysis of dimethyl dichlorosilane (other methyl chlorosilane hydrolysis will also produce HCl gas) will produce a large amount of HCl in the process of producing rings and threads, and these HCl gases will enter the methyl chloride production unit , react with methanol to produce methyl chloride. [0003] Since dimethyldichlorosilane is hydrolyzed to generate an oily silicone linear mixture, the generated HCl gas will entrain a small amount of oily mixture into the methyl chloride production unit. As the synthesis of methyl chloride continues, these oily mixtures will be released. Polymerization enrichment continues to occur in the methyl chloride reactor, and is entraine...

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Problems solved by technology

This patent is the same as the patent CN201420848256.3, but still has the disadvantage that the siloxane mixture sticks to the plugging filler and the electrostatic equipment, and the cleaning operation of the equipment in the later stage is very cumbersome, especially in an acidic environment, the corrosion damage of the electrostatic equipment is serious. Affects the overall HCl gas removal effect, so the disadvantages are also very obvious

[0008] The scheme disclosed in the patent CN201922036383.9 is a low-temperature cooling method, and the oily substance entrained by HCl gas is condensed and collected. It has a better effect on chemically stable oily substances, but there are also viscous chemical substances that can undergo polymerization reactions. The problem of clogging the degreaser, so it cannot meet the needs of organic silicon monomer hydrolysis HCl gas removal

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