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Ultralow-concentration flowing gas distribution system and gas distribution method

An ultra-low concentration, gas path technology, used in mixing methods, chemical instruments and methods, mixer accessories, etc., can solve problems such as failure to form a system, poor gas distribution effect, and difficulty in gas distribution.

Active Publication Date: 2021-11-05
NINGBO UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Low-concentration gas distribution devices have been reported in domestic and foreign media, but ultra-low concentration flow gas distribution devices and systems that can achieve ppb or lower levels are relatively rare
[0004] For some gas distribution devices on the existing market that are said to be able to prepare ppb-level gas concentrations, they actually depend on the gas distribution accuracy of the MFC machine itself and the concentration of the gas source or liquid source used, which is difficult in practical applications. Accurate gas distribution is achieved, but the gas distribution effect is poor and not systematic

Method used

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  • Ultralow-concentration flowing gas distribution system and gas distribution method

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0039] As shown in the figure, an ultra-low concentration flow gas distribution system includes:

[0040] The gas mass flow control module is used to control the background gas and test gas to enter the gas distribution system with a certain quality and flow;

[0041] The VOCs injection control module is used to inject liquid VOCs into the pipeline at a certain flow rate;

[0042] The gas distribution control module includes a heating device for vaporizing the liquid VOCs injected by the VOCs injection control module, a constant temperature device for maintaining the temperature, and a secondary gas distribution device for secondary concentration adjustment of the test gas;

[0043] The main control module is connected with the gas mass flow control module to control the quality and flow of background gas and test gas, connected with the VOCs injection control module to control the opening and closing and flow rate of liquid VOCs injection, and connected with the gas distribut...

Embodiment 2

[0045] This embodiment proposes an ultra-low concentration flow gas distribution system, which further describes the specific structure of the gas mass flow control module on the basis of the first embodiment. In this embodiment, the gas mass flow control module includes a background gas circuit, a test gas circuit, and a first mass flow controller for respectively controlling the flow values ​​of each gas circuit, the first mass flow controller is connected to the main control module, and the background gas circuit includes At least three channels: the first channel of diluted background gas 1, the second channel of diluted background gas 2 and the third channel of diluted background gas 3. The inlet ends of each background gas circuit are connected to the background gas source, and the inlet ports of the test gas circuit are connected to The test gas source, the test gas path is mixed with the first diluted background gas to form a mixed gas and enters the gas distribution co...

Embodiment 3

[0048] This embodiment proposes an ultra-low concentration flow gas distribution system, which further explains the specific structure of the VOCs injection control module on the basis of the above embodiments. In this embodiment, the VOCs injection control module includes a liquid VOCs source 9, a power propeller 10, a syringe (not shown) and a three-way valve 11. The liquid VOCs source is connected to one end of the three-way valve 11 through the syringe, and the three-way The other two ends of the valve 11 are respectively connected to the first dilute background gas 1, and the power propeller 10 is connected to the main control module for controlling the injection of liquid VOCs into the first dilute background gas 1 at a certain flow rate. Mix to form the liquid-gas mixing path 12. The VOCs injection control module can realize the uniform injection of VOCs into the pipeline in the form of liquid, and make the VOCs vaporize quickly when they reach the boiling point in the ...

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Abstract

The invention discloses an ultralow-concentration flowing gas distribution system and method. The system is characterized in that the system comprises the following modules of: a gas mass flow control module which is used for controlling background gas and test gas to enter the system at a certain mass flow; a volatile organic compounds (VOCs) injection control module used for injecting liquid VOCs into a pipeline at a certain flow rate; a gas distribution control module which comprises a heating device for vaporizing the liquid VOCs, a constant temperature device for keeping the temperature and a secondary gas distribution device for the test gas; and a main control module which is connected with the gas mass flow control module so as to be used for controlling the mass flow of the background gas and the test gas, is connected with the VOCs injection control module so as to be used for controlling the opening, closing and flow velocity of liquid VOCs injection, is connected with the VOCs distribution control module so as to be used for controlling heating and constant temperature, receiving feedback data and controlling the concentration of secondary gas distribution. According to the ultralow-concentration flowing gas distribution system and gas distribution method, gas and liquid can be blended into any ppb-level test gas with an ultralow concentration value, the gas is distributed in a real-time flowing manner, the control is accurate, the gas distribution is accurate, and the stability is good.

Description

technical field [0001] The invention relates to the field of ultra-low concentration gas distribution devices, in particular to an ultra-low concentration flow gas distribution system and a gas distribution method. Background technique [0002] The gas distribution device is widely used in production and life, industrial testing, experimental scientific research and other fields, and is the core device for calibrating and adjusting gas concentration. For example, in the testing process of sensitive materials such as sensors, background gas and test gas with different concentration values ​​need to be dynamically injected into the test chamber of sensitive materials such as sensors in real time as time changes. The concentration of the background gas is generally at the ppm (parts per million) level, which can usually be achieved through MFC (Mass Flow Controller, gas mass flow controller) gas distribution. However, the concentration of the test gas often needs to reach the ...

Claims

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Application Information

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IPC IPC(8): G01N33/00G01N1/38B01D1/30B01F3/02B01F15/00B01F15/04B01F15/06B01F23/10
CPCG01N33/007G01N33/0018G01N1/38B01D1/30G01N33/0072Y02A50/20
Inventor 钱显威邹杰简家文李雪宾谢建军
Owner NINGBO UNIV
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