Electrojet three-dimensional printing device and method for preparing micro-nano-scale beam structure

Abstract

The invention belongs to the technical field of advanced manufacturing, and relates to an electrojet three-dimensional printing device and method for preparing a micro-nano-scale beam structure. A three-dimensional fixed support is printed on a substrate drop by drop / stack by stack by using micro-nano-scale electrojet obtained by an electrohydrodynamic effect, and a solvent contained in the three-dimensional fixed support is continuously volatilized when the support is semi-cured and has certain viscosity, a beam structure solution is replaced, printing parameters are adjusted to obtain a micro-nano-scale high-viscosity continuous jet flow, the jet flow is printed on the three-dimensional fixed support, the high-viscosity continuous jet flow and the semi-cured fixed support are fully bonded, a micro-nano simply supported beam structure is obtained after the high-viscosity continuous jet flow and the semi-cured fixed support are completely cured, and the three-dimensional fixed support at one end is removed through high-energy laser pyrolysis or the simply supported beam structure is segmented by utilizing a micro-cutting technology to obtain a micro-nano cantilever beam structure. The printing method for preparing the micro-nano-scale beam structure has the advantages of being wide in material adaptability, short in machining period and the like, and an effective way is provided for efficient and low-cost manufacturing of high-performance devices of a micro-nano-scale beam structure.

Description

technical field [0001] The invention belongs to the field of advanced manufacturing technology, and relates to an electro-jet three-dimensional printing device and method for preparing micro-nano-scale beam structures. Background technique [0002] The micro-nano-scale beam structure has outstanding advantages such as high flexibility and high sensitivity, and has become one of the important structures of micro-nano devices. Devices with micro-nano beams as the core sensing unit show higher sensitivity, higher integration and lower Outstanding performance such as power consumption has broad application prospects in the fields of biomedicine, energy and environment. At present, chemical vapor deposition and transfer methods are mostly used to prepare micro-nano scale beam structures. There is a large accumulation of charges and heat in the preparation of micro-nano beam structures by chemical vapor deposition, which changes the growth characteristics of the structure, and th...

AI Technical Summary

Problems solved by technology

However, the transfer method has complicated process, special processing conditions, and high cost. In addition, the ends of the transferred micro-nano-scale beam structure need to be welded and fixed by special processes, which undoubtedly increases its preparation cost and cycle time.

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