Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

CuAl alloy sample preparation method suitable for ICP-OES

A technology of alloy and alloy target, which is applied in the field of analysis of CuAl alloy and CuAl alloy sample preparation of ICP-OES, which can solve the problems that are not conducive to ensuring the detection efficiency of CuAl alloy target, the use method is complicated, and it is not easy to operate, so as to avoid background influence , Simple operation and small deviation of results

Pending Publication Date: 2021-07-13
KONFOONG MATERIALS INTERNATIONAL CO LTD
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The above method of use is relatively complicated, and it takes a long time to corrode the Al-4% Cu alloy, and it is not easy to operate, which is not conducive to ensuring the detection efficiency of the CuAl alloy target.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0042] This embodiment provides a CuAl alloy sample preparation method suitable for ICP-OES. The CuAl alloy sample preparation method includes the following steps: the mass percentage of Al in the CuAl alloy target is 0.1wt%;

[0043] Mix the CuAl alloy target with the mixed acid at a solid-liquid ratio of 1:60, and heat it at 90°C for 9 minutes to obtain a sample solution. The unit of the solid-liquid ratio is g / mL;

[0044] Described mixed acid is nitric acid and hydrofluoric acid that volume ratio 1:2 forms, and the concentration of described nitric acid is 66wt%, and the concentration of described hydrofluoric acid is 36wt%;

[0045] The heat preservation is accompanied by ultrasound; the ultrasound includes the first ultrasound and the second ultrasound performed in sequence;

[0046] The power of the first ultrasound is 300W, and the time of the first ultrasound is 3min;

[0047] The power of the second ultrasound is 600W, and the time of the second ultrasound is 6min. ...

Embodiment 2

[0050] This embodiment provides a CuAl alloy sample preparation method suitable for ICP-OES. The CuAl alloy sample preparation method includes the following steps: the mass percentage of Al in the CuAl alloy target is 0.1wt%;

[0051] Mix the CuAl alloy target with the mixed acid at a solid-liquid ratio of 1:55, and heat it at 95°C for 8.5 minutes to obtain a sample solution. The unit of the solid-liquid ratio is g / mL;

[0052] The mixed acid is nitric acid and hydrofluoric acid with a volume ratio of 1:1.9, the concentration of the nitric acid is 66wt%, and the concentration of the hydrofluoric acid is 36wt%;

[0053] The heat preservation is accompanied by ultrasound; the ultrasound includes the first ultrasound and the second ultrasound performed in sequence;

[0054] The power of the first ultrasound is 250W, and the time of the first ultrasound is 3.5min;

[0055] The power of the second ultrasound is 700W, and the time of the second ultrasound is 5min.

[0056] The sam...

Embodiment 3

[0058] This embodiment provides a CuAl alloy sample preparation method suitable for ICP-OES. The CuAl alloy sample preparation method includes the following steps: the mass percentage of Al in the CuAl alloy target is 0.1wt%;

[0059] Mix the CuAl alloy target with the mixed acid at a solid-liquid ratio of 1:65, and heat it at 85°C for 9.5 minutes to obtain a sample solution. The unit of the solid-liquid ratio is g / mL;

[0060] The mixed acid is nitric acid and hydrofluoric acid with a volume ratio of 1:2.1, the concentration of the nitric acid is 66wt%, and the concentration of the hydrofluoric acid is 36wt%;

[0061] The heat preservation is accompanied by ultrasound; the ultrasound includes the first ultrasound and the second ultrasound performed in sequence;

[0062] The power of the first ultrasound is 350W, and the time of the first ultrasound is 2.5min;

[0063] The power of the second ultrasound is 600W, and the time of the second ultrasound is 7min.

[0064] The sam...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a CuAl alloy sample preparation method suitable for ICP-OES (Inductively Coupled Plasma Optical Emission Spectrometer), which comprises the following steps: mixing a CuAl alloy target material and mixed acid, and preserving heat for 8-10 minutes to obtain a sample solution; wherein the mixed acid is composed of nitric acid and hydrofluoric acid in a volume ratio of 1:(1.8-2.2), the concentration of the nitric acid is 65-68wt%, and the concentration of the hydrofluoric acid is 35-38wt%. According to the CuAl alloy sample preparation method, the CuAl alloy target material can be completely dissolved within 10 min, the dissolution efficiency is high, ICP-OES testing is not affected after dissolution, and the blank of sample preparation during ICP-OES testing of the CuAl alloy target material is filled.

Description

technical field [0001] The invention belongs to the technical field of semiconductors and relates to a method for analyzing CuAl alloys, in particular to a CuAl alloy sample preparation method suitable for ICP-OES. Background technique [0002] Magnetron sputtering technology is widely used in various fields such as material surface device, material surface modification and optical device production. The principle of magnetron sputtering is: in a vacuum state, when a negative potential is applied to the magnetron sputtering target and a positive potential is applied to the workpiece to be coated, an electric field is formed in the vacuum chamber where the magnetron sputtering target is located, and then The process carrier gas is filled into the vacuum chamber. Under a certain pressure and temperature, a discharge phenomenon will occur between the positive potential and the negative potential. The electrons move along the circular orbit and hit the process carrier gas molecu...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G01N1/28G01N1/44G01N21/73
CPCG01N1/28G01N1/44G01N21/73
Inventor 姚力军边逸军潘杰王学泽俞晗
Owner KONFOONG MATERIALS INTERNATIONAL CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products