Amorphous silicon target material bearing device

Abstract

The invention discloses an amorphous silicon target material bearing device. The amorphous silicon target material bearing device comprises an upper clamping plate, a lower clamping plate, a top plate and a moving device, wherein the upper clamping plate and the lower clamping plate are used for clamping a plate-shaped amorphous silicon target material; the top plate is used for supporting the upper clamping plate and the lower clamping plate; the moving device is connected with the top plate and is used for driving the top plate to move; the top plate is provided with a first hollowed-out area, the upper clamping plate is provided with a second hollowed-out area, and the lower clamping plate is provided with a third hollowed-out area; a plurality of screws are in threaded connection with the bottom surface of the top plate and penetrate through the upper clamping plate and the lower clamping plate respectively; and the screws are sleeved with springs respectively, and the springs are compressed between the upper clamping plate and the top plate. The amorphous silicon target material bearing device can be applied to a laser transfer printing process, the position of the target material can be adjusted multiple times, transfer printing effect is guaranteed while the target material is utilized multiple times, and the cost of the target material can be greatly reduced.

Description

Technical field [0001] The present invention relates to the field of laser transfer techniques, and more particularly to an amorphous silicon target carrying apparatus for laser transfer. Background technique [0002] In the semiconductor and solar cell, amorphous silicon is a widely utilized semiconductor material. Amorphous silicon patterning of the semiconductor device surface can be used to prepare high-performance semiconductor devices and solar cells. An advanced amorphous silicon deposition method utilizes laser transfer to prepare patterned amorphous silicon in the surface of the device, the method using laser irradiation amorphous silicon target, transfer amorphous silicon on the surface of the target to semiconductor device The surface is formed, forming a patterned amorphous silicon layer. [0003] The amorphous silicon target usually uses a flat quartz material as a carrier, and the amorphous silicon target is usually only once in the laser transfer process, which gre...

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Problems solved by technology

[0003] The amorphous silicon target usually uses a flat quartz material as the carrier plate. The service life of the amorphous silicon target is only once in the laser transfer process, which greatly increases the cost of the amorphous silicon target.

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