Black material, and preparation method and application thereof
A technology of black and base materials, applied in the field of black materials, can solve problems such as not being able to meet the requirements of optical imaging systems, and achieve the effect of wide application fields
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[0025] The second aspect of the present invention provides a method for preparing a black material, comprising: forming a thin film containing alternately laminated high light-absorbing film layers and low-refractive index optical film layers on the surface of a substrate by PVD; wherein, forming the The light absorption coefficient of the material of the high light-absorbing film layer is >1.5, the refractive index of the material forming the low-refractive index optical film layer is <1.75, and the total number of layers of the high-light-absorbing film layer and the low-refractive index optical film layer is at least 4, so The film layer adjacent to the substrate is a high light-absorbing film layer; wherein, the material forming the high light-absorbing film layer is selected from one or more of Fe, Nb, Co, Ni, Zn, Zr and Cd species; the material forming the low refractive index optical film layer is selected from one or more of alumina, silicon dioxide and magnesium fluori...
Embodiment 1
[0044] a. Using Corning 3rd generation glass as the base material, after cleaning with a tank type ultrasonic cleaner, load it on the coating fixture and vacuumize it;
[0045] b. When the vacuum degree is 1×10 -3 Pa, fill the machine with argon gas, turn on the ion source after the gas is stable, and perform ion cleaning on the surface of the substrate and the target material for 15 minutes;
[0046] c. Keep the argon valve open, and then turn on the sputtering power supply of the Nb target with a power of 10kW to obtain the first high light-absorbing film layer with a thickness of 300nm and an absorption coefficient of 2.48;
[0047] d. turn off the sputtering power supply of the Nb target material, open the oxygen gas valve again, set the flow rate of 150sccm, turn on the sputtering power supply of the Si target material afterwards, and the power is 10kW to obtain the first low refractive index optical film layer with a thickness of 48nm, The refractive index is 1.46;
[...
Embodiment 2
[0053] a. Using Corning 3rd generation glass as the base material, after cleaning with a tank type ultrasonic cleaner, load it on the coating fixture and vacuumize it;
[0054] b. When the vacuum degree is 8×10 -3 Pa, fill the machine with argon gas, turn on the ion source after the gas is stable, and perform ion cleaning on the surface of the substrate and the target material for 20 minutes;
[0055] c. Keep the argon valve open, and then turn on the sputtering power supply of the Nb target with a power of 10kW to obtain the first high light-absorbing film layer with a thickness of 4.5nm and an absorption coefficient of 2.48;
[0056] d. turn off the sputtering power supply of the Nb target material, open the oxygen gas valve again, set the flow rate of 150sccm, turn on the sputtering power supply of the Si target material afterwards, and the power is 10kW to obtain the first low refractive index optical film layer with a thickness of 76nm, The refractive index is 1.46;
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