A chip testing method in a wide temperature range working environment
A working environment and chip testing technology, applied in printed circuit testing, electronic circuit testing, electrical measurement, etc., can solve problems such as plastic deformation of probes, inability to complete bare core test work, and inability to complete bare core test work
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specific Embodiment approach 1
[0091] The following is a specific implementation of the MEMS probe structure of the present invention for chip testing in an ultra-high temperature working environment.
[0092] The structure of the MEMS probe for chip testing under the ultra-high temperature working environment under the present embodiment, the structural diagram is as follows figure 1 As shown, the MEMS probe structure is provided with a PCB board 3, an adapter plate 2 and a composite probe head structure 1 in sequence from top to bottom, and the composite probe head structure 1 includes an upper guide plate 1-1 and a middle guide plate 1-2 And the lower guide plate 1-3, the probe 1-4 starts from the adapter plate 2, passes through the upper guide plate 1-1 and the middle guide plate 1-2, and protrudes from the lower guide plate 1-3; wherein, the upper guide plate 1-1 , the middle guide plate 1-2 and the lower guide plate 1-3 are made of insulating materials, and the probes 1-4 are made of metal conductive ...
specific Embodiment approach 2
[0097] The following is a specific implementation of the MEMS probe structure of the present invention for chip testing in an ultra-high temperature working environment.
[0098] The MEMS probe structure for chip testing under the ultra-high temperature working environment under this embodiment, on the basis of the specific embodiment 1, further defines that the middle probe 1-4-2 is composed of at least one of antimony, bismuth or gallium Made of metal alloy materials. Since antimony, bismuth, and gallium are substances that expand with cold and shrink with heat, they are often used to make alloys to reduce the influence of temperature on precision instruments. Therefore, using them to make the middle probe 1-4-2 can not only meet the conductivity, but also can Realize thermal shrinkage and cold expansion characteristics.
[0099] In addition, the nickel sulfide used to make the tempered glass self-explode is also a substance that expands with cold and shrinks with heat, and...
specific Embodiment approach 3
[0100] The following is a specific implementation of the chip testing method in the wide temperature range working environment of the present invention.
[0101] The chip testing method under the wide temperature range working environment under this embodiment is implemented on the MEMS probe structure facing the chip testing under the ultra-high temperature working environment described in the specific embodiment 1 or the specific embodiment 2. The wide temperature range working environment The chip testing method includes the chip testing method under the normal temperature working environment and the chip testing method under the ultra high temperature working environment, wherein, the chip testing method flow chart under the normal temperature working environment is as follows figure 2 As shown, the flow chart of the chip testing method under the ultra-high temperature working environment is as follows image 3 shown;
[0102] The normal temperature working environment r...
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