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Sputter ion pump baking device

The technology of a baking device and an ion pump is applied in the field of sputtering ion pump, and can solve the problems of low baking efficiency of a baking heater, poor baking heating effect of an air extraction unit, etc.

Pending Publication Date: 2021-05-18
SHANGHAI MITSUI GUANGZHONG VACUUM EQUIP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In view of the above-mentioned problems, the purpose of the present invention is to provide a sputter ion pump baking device, which solves the technical problems of low baking efficiency of the baking heater and poor baking heating effect of the pumping unit

Method used

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Embodiment Construction

[0020] The following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the drawings and specific embodiments of the present invention. Obviously, the described embodiments are only some of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0021] It should be pointed out that the orientation words "upper" and "lower", "inner" and "outer" mentioned herein are defined based on the relative positions of the components in the drawings of the present invention, and are only used to describe the technical solutions. Clear and convenient, it should be understood that the application of this location word does not constitute a limit to the protection scope of this application.

[0022] In the d...

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Abstract

The invention discloses a sputter ion pump baking device which comprises an ion pump body, wherein a pump cavity of the ion pump body is a vacuum cavity, an air exhaust unit is arranged in the vacuum cavity, an air exhaust channel is fixedly installed in the middle part of the upper end of the ion pump body and communicates with the interior of the vacuum cavity, a vacuum flange is fixedly connected to the upper end of the air exhaust channel, and a baking heater is arranged in the vacuum cavity of the ion pump body. For the sputter ion pump baking device disclosed by the invention, the baking heater is arranged in the pump cavity of the ion pump body and directly bakes and heats the inner wall of the inner pump body, so that the baking efficiency is high; in addition, the baking heater is far away from a magnet, and the magnet is not prone to high-temperature demagnetization, so that the magnet which is higher in magnetism and slightly low in temperature resistance can be selected; the baking heater of the sputter ion pump is located in the pump cavity of the ion pump body, and the baking heating effect on the air exhaust unit is remarkably improved.

Description

technical field [0001] The invention relates to the technical field of sputter ion pumps, in particular to a sputter ion pump baking device. Background technique [0002] The sputter ion pump is a clean and oil-free ultra-high vacuum pump, which is widely used in the ultra-high vacuum field of modern cutting-edge technology. Including atomic energy, nuclear industry, particle accelerator, aerospace, space simulation, surface physics, electronics industry and other high-tech fields. The advantages of the sputtering ion pump are: 1. No oil, no vibration and no noise; 2. Simple and reliable use, long life and bakeable; 3. No refrigerant required, and the placement direction is not limited; 4. In ultra-high vacuum There is still a relatively large pumping speed, and the ultimate vacuum degree is high (up to 10 -9 ~10 -10 Pa). [0003] see figure 1 As shown, the heating method of traditional sputter ion pump baking is to place the heater 5 between the pump casing 11 and the ...

Claims

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Application Information

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IPC IPC(8): F26B5/04F26B9/06F26B23/06F26B25/00F26B25/12
CPCF26B5/041F26B9/06F26B23/06F26B25/002F26B25/12
Inventor 郑主安
Owner SHANGHAI MITSUI GUANGZHONG VACUUM EQUIP CO LTD
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